Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.56 |
| ▸ | TP53 | P04637 | 3/20 | 0.55 |
| ▸ | TSHR | P16473 | 3/20 | 0.55 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | PKM | P14618 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | DHFR | P00374 | 2/20 | 0.41 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.39 |
| ▸ | SRC | P12931 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL21633948 | 0.92 | TDP1 (0.58) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL14655761 | 0.91 | ALDH1A1 (0.57) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL17019518 | 0.91 | TDP1 (0.53) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL17827256 | 0.91 | TDP1 (0.53) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL14655785 | 0.89 | ALDH1A1 (0.56) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL23271762 | 0.89 | ALDH1A1 (0.59) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL464600 | 0.87 | TDP1 (0.53) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL13750583 | 0.86 | TDP1 (0.51) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL31560427 | 0.85 | TDP1 (0.47) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL23271831 | 0.85 | ALDH1A1 (0.51) | TDP1ALDH1A1GLATP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-119916644-A | Photosensitive resin composition containing alkynyl anthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-118732123-A | Optical laminate | 住友化学株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| US-20230187208-A1 | PROTECTIVE FILM-FORMING COMPOSITION CONTAINING DIOL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230187208-A1 | PROTECTIVE FILM-FORMING COMPOSITION CONTAINING DIOL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11674051-B2 | Stepped substrate coating composition containing compound having curable functional group | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11674051-B2 | Stepped substrate coating composition containing compound having curable functional group | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| CN-113574083-A | Adhesive composition, adhesive tape, and method for processing electronic component | 积水化学工业株式会社 | 2021-10-29 | — | — | CN | disclosed |
| WO-2012150925-A1 | BISPHENOL-A REPLACEMENT MATERIALS | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2012-11-08 | — | — | WO | disclosed |
| US-8227561-B1 | Bisphenol-A replacement materials | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2012-07-24 | — | — | US | disclosed |
| EP-1876495-B1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-07-20 | — | — | EP | disclosed |
| US-20110118374-A1 | Method for Preparing a Hard Film or Coating from a Cationically Cross-Linkable/Polymerizable Composition Comprising an Iodonium Borate and Giving Off an Acceptable Odour | BLUESTAR SILICONES FRANCE SAS (FR) | 2011-05-19 | — | — | US | disclosed |
| US-7842620-B2 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-30 | — | — | US | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-7632626-B2 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-15 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| US-20080268379-A1 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-10-30 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | PPOX, NOX4, CROCC | TDP1 4412/4885ALDH1A1 1023/4885GLA 1506/4885 |
| US-20230187208-A1 | PROTECTIVE FILM-FORMING COMPOSITION CONTAINING DIOL STRUCTURE | DSG1, RAD51, CDH1 | TDP1 2158/4885ALDH1A1 1697/4885GLA 2657/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.