SCHEMBL1715947

SCHEMBL1715947

c1ccc2c(OCC3CO3)ccc(OCC3CO3)c2c1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.65
GLA P06280 1/20 0.65
TDP1 Q9NUW8 1/20 0.60
TP53 P04637 3/20 0.53
TSHR P16473 3/20 0.53
HIF1A Q16665 2/20 0.53
CYP3A4 P08684 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
MAPT P10636 2/20 0.43
HPGD P15428 2/20 0.43
PKM P14618 2/20 0.43
CYP1A2 P05177 1/20 0.43
PPARG P37231 1/20 0.43
LMNA P02545 1/20 0.43
GAA P10253 1/20 0.43
PDK1 Q15118 1/20 0.41
ADRB2 P07550 1/20 0.40
HTR1A P08908 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19859437 1.00 ALDH1A1 (0.65) ALDH1A1GLATDP1TP53TSHR
SCHEMBL29417583 1.00 ALDH1A1 (0.65) ALDH1A1GLATDP1TP53TSHR
SCHEMBL729501 0.92 ALDH1A1 (0.65) ALDH1A1GLATDP1TP53TSHR
SCHEMBL5517102 0.91 ALDH1A1 (0.60) ALDH1A1GLATDP1TP53TSHR
SCHEMBL5511491 0.90 ALDH1A1 (0.54) ALDH1A1GLATDP1TP53TSHR
SCHEMBL17912832 0.90 ALDH1A1 (0.54) ALDH1A1GLATDP1TP53TSHR
SCHEMBL9250607 0.88 ALDH1A1 (0.53) ALDH1A1GLATDP1TP53TSHR
SCHEMBL24452831 0.87 ALDH1A1 (0.55) ALDH1A1GLATDP1TP53TSHR
SCHEMBL2649023 0.86 ALDH1A1 (0.50) ALDH1A1GLATDP1TP53TSHR
SCHEMBL22926787 0.86 ALDH1A1 (0.50) ALDH1A1GLATDP1TP53TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
US-11898054-B2 Actinic radiation-curable urethane/urea-containing aerospace coatings and sealants PRC-DESOTO INTERNATIONAL, INC. (US) 2024-02-13 US disclosed
WO-2023238920-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT 日産化学株式会社 2023-12-14 WO disclosed
WO-2023181960-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2023-09-28 WO disclosed
WO-2023182408-A1 COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON 日産化学株式会社 2023-09-28 WO disclosed
WO-2023149327-A1 PROTECTIVE FILM FORMING COMPOSITION 日産化学株式会社 2023-08-10 WO disclosed
US-11613509-B2 Radical polymerization control agent and radical polymerization control method KAWASAKI KASEI CHEMICALS LTD. (JP) 2023-03-28 US disclosed
US-20220404706-A1 CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM NISSAN CHEMICAL CORPORATION (JP) 2022-12-22 US disclosed
CN-114839838-A Photosensitive resin composition 味之素株式会社 2022-08-02 CN disclosed
US-20220153920-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-20080268379-A1 a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-10-30 US disclosed
US-20080038678-A1 Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2008-02-14 US disclosed
EP-1876495-A1 COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2008-01-09 EP disclosed
CN-1965268-A Antireflection film for semiconductor containing condensation type polymer NISSAN CHEMICAL IND LTD (JP) 2007-05-16 CN disclosed
EP-1757986-A1 ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER Nissan Chemical Industries, Ltd. (JP) 2007-02-28 EP disclosed
EP-0810249-B1 Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same HITACHI LTD (JP) 2001-11-07 EP disclosed
US-5982056-A STATOR OF ROTATING MACHINE HITACHI, LTD. (JP) 1999-11-09 US disclosed
EP-0810249-A2 Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same HITACHI, LTD. (JP) 1997-12-03 EP disclosed
US-4954584-A Thermosetting resin compositions SHELL OIL COMPANY (US) 1990-09-04 US disclosed
US-4954583-A Arylcyclobutene carboxylate esters SHELL OIL COMPANY (US) 1990-09-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11613509-B2 Radical polymerization control agent and radical polymerization control method PPOX, NOX4, CROCC ALDH1A1 1023/4885GLA 1506/4885TDP1 4412/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.