SCHEMBL172220

SCHEMBL172220

C1=CC2Nc3ccccc3SC2C=C1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 3/20 0.61
IDO1 P14902 2/20 0.48
RAB9A P51151 1/20 0.36
MAOB P27338 1/20 0.35
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
NPC1 O15118 1/20 0.34
POLB P06746 2/20 0.33
ALOX15 P16050 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
CYP1A2 P05177 1/20 0.33
BCHE P06276 1/20 0.33
CYP3A4 P08684 1/20 0.33
ADORA3 P0DMS8 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
ALOX12 P18054 1/20 0.33
CNR1 P21554 1/20 0.33
ACHE P22303 1/20 0.33
PTGS1 P23219 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17602387 0.76 IDO1 (0.43) MAOAIDO1RAB9AMAOBMEN1
SCHEMBL12213605 0.75 IDO1 (0.42) MAOAIDO1RAB9AMAOBMEN1
SCHEMBL8620692 0.73 CREBBP (0.37) MAOAIDO1MEN1KMT2ANPC1
SCHEMBL12199688 0.73 ALOX5 (0.43) MAOAIDO1ALOX5
SCHEMBL16711400 0.70 IDO1 (0.57) MAOAIDO1RAB9AMEN1KMT2A
SCHEMBL16181708 0.70 IDO1 (0.57) MAOAIDO1RAB9AMEN1KMT2A
SCHEMBL12661831 0.70 IDO1 (0.57) MAOAIDO1RAB9AMEN1KMT2A
SCHEMBL338205 0.70 IDO1 (0.57) MAOAIDO1RAB9AMEN1KMT2A
SCHEMBL12844858 0.69 HSD17B10 (0.47) MAOARAB9AMEN1KMT2ANPC1
SCHEMBL21808704 0.69 IDO1 (0.61) MAOAIDO1RAB9AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260018402-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE ASM IP HOLDING BV (NL) 2026-01-15 US claimed
US-20260015717-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE ASM IP HOLDING BV (NL) 2026-01-15 US claimed
US-20250391655-A1 METHOD OF FILLING GAP AND PROCESSING SYSTEM FOR SAME ASM IP HOLDING BV (NL) 2025-12-25 US claimed
CN-119725217-A Method for filling trenches on a substrate surface ASM IP私人控股有限公司 2025-03-28 CN claimed
US-20250104999-A1 METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE ASM IP HOLDING B.V. (NL) 2025-03-27 US claimed
CN-114957578-B Covalent organic framework material based on thienyl and oxazinyl, and preparation method and application thereof 南京理工大学 2024-03-19 CN claimed
CN-114957578-A Thienyloxazinyl based covalent organic framework material and preparation method and application thereof 南京理工大学 2022-08-30 CN claimed
US-20220251707-A1 METHODS OF FILLING RECESSES ON SUBSTRATE SURFACE, STRUCTURES FORMED USING THE METHODS, AND SYSTEMS FOR FORMING SAME ASM IP HOLDING B.V. (NL) 2022-08-11 US claimed
CN-114864478-A Method, system and structure for filling a recess on a substrate surface ASM IP私人控股有限公司 2022-08-05 CN claimed
US-20260015717-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE ASM IP HOLDING BV (NL) 2026-01-15 US disclosed
US-20260018402-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE ASM IP HOLDING BV (NL) 2026-01-15 US disclosed
US-20250391655-A1 METHOD OF FILLING GAP AND PROCESSING SYSTEM FOR SAME ASM IP HOLDING BV (NL) 2025-12-25 US disclosed
US-20250336668-A1 METHODS OF FILLING RECESSES ON SUBSTRATE SURFACES AND FORMING VOIDS THEREIN ASM IP HOLDING BV (NL) 2025-10-30 US disclosed
US-12381077-B2 Methods of filling recesses on substrate surfaces and forming voids therein ASM IP HOLDING B.V. (NL) 2025-08-05 US disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed
US-7202367-B2 Process for arylating or vinylating or alkynating a nucleophilic compound RHODIA CHIMIE (FR) 2007-04-10 US disclosed
US-7202367-B2 Process for arylating or vinylating or alkynating a nucleophilic compound RHODIA CHIMIE (FR) 2007-04-10 US disclosed
US-20070010683-A1 Carbon-carbon bond creation method comprising the coupling of a transferable group and an acceptor group RHODIA-CHIMIE (FR) 2007-01-11 US disclosed
US-20070010683-A1 Carbon-carbon bond creation method comprising the coupling of a transferable group and an acceptor group RHODIA-CHIMIE (FR) 2007-01-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260018402-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE F9, P2RX4, NT5C MAOA 88/4885IDO1 2018/4885RAB9A 1046/4885
US-20250391655-A1 METHOD OF FILLING GAP AND PROCESSING SYSTEM FOR SAME RAD51, SEM1, RAD1 MAOA 2288/4885IDO1 1213/4885RAB9A 839/4885
US-20070010683-A1 Carbon-carbon bond creation method comprising the coupling of a transferable group and an acceptor group C9, NUDC, PIK3C2A MAOA 2629/4885IDO1 4544/4885RAB9A 266/4885
US-20260015717-A1 METHODS OF FILLING GAP ON SUBSTRATE SURFACE FTO, TET2, HAO2 MAOA 326/4885IDO1 3299/4885RAB9A 1744/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.