SCHEMBL17341906

SCHEMBL17341906

CC(C)(C)C(=O)/C(=N\OC(=O)N1CCCCC1)c1nc2ccccc2o1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ XDH P47989 8/20 0.43
▸ HSF1 Q00613 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ TLR4 O00206 1/20 0.40
▸ NLRP3 Q96P20 1/20 0.40
▸ FAAH O00519 2/20 0.39
▸ RBP4 P02753 1/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ TNF P01375 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ LMNA P02545 2/20 0.37
▸ HTT P42858 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ GAA P10253 1/20 0.37
▸ KMT2A Q03164 1/20 0.37
▸ THRB P10828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341925 0.86 HSF1 (0.45) XDHHSF1HPGDTLR4NLRP3
SCHEMBL17341904 0.85 XDH (0.40) XDHHSF1FAAHRBP4LMNA
SCHEMBL17341913 0.84 HPGD (0.40) HPGDNPC1RAB9ALMNAHTT
SCHEMBL17341931 0.84 XDH (0.62) XDHHSF1HPGDTLR4NLRP3
SCHEMBL17341902 0.82 FAAH (0.44) XDHHSF1HPGDFAAHRBP4
SCHEMBL17341928 0.78 XDH (0.49) XDHHSF1TLR4NLRP3FAAH
SCHEMBL17341908 0.78 NPC1 (0.48) XDHHSF1TLR4NLRP3FAAH
SCHEMBL17341921 0.77 SMN1; SMN2 (0.47) HPGDNPC1RAB9ALMNAHTT
SCHEMBL17341897 0.77 SMN1; SMN2 (0.49) HSF1HPGDRBP4NPC1RAB9A
SCHEMBL17341917 0.76 SMN1; SMN2 (0.50) HSF1HPGDRBP4NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI XDH 3449/4885HSF1 1510/4885HPGD 4208/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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