SCHEMBL17341925

SCHEMBL17341925

CC(C)(C)C(=O)/C(=N\OC(=O)N1CCCCC1)c1nc2ccc(Cl)cc2o1

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ HSF1 Q00613 5/20 0.45
▸ RAB9A P51151 5/20 0.38
▸ NPC1 O15118 4/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ GLA P06280 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ XDH P47989 2/20 0.37
▸ NLRP3 Q96P20 2/20 0.37
▸ TLR4 O00206 1/20 0.37
▸ KMT2A Q03164 1/20 0.36
▸ PKM P14618 1/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ HSD17B10 Q99714 1/20 0.35
▸ FASN P49327 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341906 0.86 XDH (0.43) HSF1RAB9ANPC1SMN1; SMN2LMNA
SCHEMBL17341913 0.79 HPGD (0.40) RAB9ANPC1SMN1; SMN2ALDH1A1LMNA
SCHEMBL17341904 0.72 XDH (0.40) HSF1LMNAXDH
SCHEMBL17341931 0.70 XDH (0.62) HSF1ALDH1A1HPGDXDHNLRP3
SCHEMBL17341921 0.70 SMN1; SMN2 (0.47) RAB9ANPC1SMN1; SMN2ALDH1A1LMNA
SCHEMBL17341902 0.69 FAAH (0.44) HSF1SMN1; SMN2ALDH1A1LMNAMAPT
SCHEMBL17341897 0.68 SMN1; SMN2 (0.49) HSF1RAB9ANPC1SMN1; SMN2ALDH1A1
SCHEMBL3078363 0.67 PTGES (0.52) SMN1; SMN2LMNAKMT2A
SCHEMBL17341917 0.67 SMN1; SMN2 (0.50) HSF1RAB9ANPC1SMN1; SMN2ALDH1A1
SCHEMBL17345547 0.67 FAAH (0.46) RAB9ANPC1SMN1; SMN2ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI HSF1 1510/4885RAB9A 295/4885NPC1 4373/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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