SCHEMBL17341931

SCHEMBL17341931

C/C(=N\OC(=O)N1CCCCC1)c1nc2ccccc2o1

nearest known ligand 0.62

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ XDH P47989 11/20 0.62
▸ NLRP3 Q96P20 3/20 0.56
▸ TLR4 O00206 1/20 0.56
▸ HPGD P15428 2/20 0.45
▸ HSF1 Q00613 1/20 0.44
▸ FAAH O00519 1/20 0.42
▸ GAA P10253 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ RBP4 P02753 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341906 0.84 XDH (0.43) XDHNLRP3TLR4HPGDHSF1
SCHEMBL17341902 0.81 FAAH (0.44) XDHHPGDHSF1FAAHGAA
SCHEMBL30530620 0.76 RBP4 (0.59) HPGDFAAHKMT2ARBP4ALDH1A1
SCHEMBL16454928 0.74 SMN1; SMN2 (0.52) HPGDGAAKMT2AALDH1A1L3MBTL1
SCHEMBL6127670 0.73 XDH (0.63) XDHNLRP3TLR4HSF1FAAH
SCHEMBL17341925 0.70 HSF1 (0.45) XDHNLRP3TLR4HPGDHSF1
SCHEMBL17341904 0.69 XDH (0.40) XDHHSF1FAAHRBP4
SCHEMBL5175392 0.69 ALDH1A1 (0.57) XDHNLRP3TLR4FAAHKMT2A
SCHEMBL17341913 0.68 HPGD (0.40) HPGDGAAKMT2AALDH1A1L3MBTL1
SCHEMBL13627044 0.68 POLB (0.52) HPGDKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI XDH 3449/4885NLRP3 1265/4885TLR4 3990/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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