Water

Water

SCHEMBL17364339

O.[AlH3].[MgH2].[SiH4].[Y]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL16969395 1.00
Water SCHEMBL29256107 0.91
Water SCHEMBL23701678 0.89
Water SCHEMBL20584293 0.89
SCHEMBL16670680 0.89
SCHEMBL28067137 0.80
Water SCHEMBL20483943 0.80
SCHEMBL29256109 0.80
SCHEMBL221632 0.78
Water SCHEMBL4931912 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11299805-B2 Plasma corrision resistive heater for high temperature processing APPLIED MATERIALS, INC. (US) 2022-04-12 US claimed
CN-107636374-B Corrugated pipe and valve component 应用材料公司 2019-12-27 CN claimed
US-20190203350-A1 PLASMA CORRISION RESISTIVE HEATER FOR HIGH TEMPERATURE PROCESSING APPLIED MATERIALS, INC. 2019-07-04 US claimed
US-10266943-B2 Plasma corrosion resistive heater for high temperature processing APPLIED MATERIALS, INC. (US) 2019-04-23 US claimed
US-10190701-B2 Corrosion control for chamber components APPLIED MATERIALS, INC. (US) 2019-01-29 US claimed
CN-107636374-A The corrosion control of chamber part 应用材料公司 2018-01-26 CN claimed
US-20170152968-A1 CORROSION CONTROL FOR CHAMBER COMPONENTS APPLIED MATERIALS, INC. (US) 2017-06-01 US claimed
US-20150376780-A1 PLASMA CORROSION RESISTIVE HEATER FOR HIGH TEMPERATURE PROCESSING APPLIED MATERIALS, INC. 2015-12-31 US claimed
US-11299805-B2 Plasma corrision resistive heater for high temperature processing APPLIED MATERIALS, INC. (US) 2022-04-12 US disclosed
CN-107636374-B Corrugated pipe and valve component 应用材料公司 2019-12-27 CN disclosed
CN-107636374-B Corrugated pipe and valve component 应用材料公司 2019-12-27 CN disclosed
US-20190203350-A1 PLASMA CORRISION RESISTIVE HEATER FOR HIGH TEMPERATURE PROCESSING APPLIED MATERIALS, INC. 2019-07-04 US disclosed
US-10266943-B2 Plasma corrosion resistive heater for high temperature processing APPLIED MATERIALS, INC. (US) 2019-04-23 US disclosed
US-10190701-B2 Corrosion control for chamber components APPLIED MATERIALS, INC. (US) 2019-01-29 US disclosed
CN-107636374-A The corrosion control of chamber part 应用材料公司 2018-01-26 CN disclosed
CN-107636374-A The corrosion control of chamber part 应用材料公司 2018-01-26 CN disclosed
US-20170152968-A1 CORROSION CONTROL FOR CHAMBER COMPONENTS APPLIED MATERIALS, INC. (US) 2017-06-01 US disclosed
US-20170152968-A1 CORROSION CONTROL FOR CHAMBER COMPONENTS APPLIED MATERIALS, INC. (US) 2017-06-01 US disclosed
WO-2016178777-A1 CORROSION CONTROL FOR CHAMBER COMPONENTS APPLIED MATERIALS, INC. (US) 2016-11-10 WO disclosed
US-20150376780-A1 PLASMA CORROSION RESISTIVE HEATER FOR HIGH TEMPERATURE PROCESSING APPLIED MATERIALS, INC. 2015-12-31 US disclosed