SCHEMBL17368742

SCHEMBL17368742

CN1C(=O)c2ccc(C(O)c3ccc4c(c3)C(=O)N(C)C4=O)cc2C1=O

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 9/20 0.50
▸ APP P05067 7/20 0.47
▸ HSD17B10 Q99714 4/20 0.47
▸ MEN1 O00255 2/20 0.47
▸ MAPT P10636 2/20 0.47
▸ KMT2A Q03164 2/20 0.47
▸ L3MBTL1 Q9Y468 2/20 0.47
▸ ALOX15 P16050 1/20 0.47
▸ CASP3 P42574 1/20 0.47
▸ HPGD P15428 4/20 0.46
▸ MAPK1 P28482 1/20 0.46
▸ KDM4E B2RXH2 3/20 0.45
▸ NR1H3 Q13133 1/20 0.42
▸ POLB P06746 1/20 0.42
▸ TSHR P16473 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31085010 0.87 ALDH1A1 (0.49) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL2835024 0.82 NR1H3 (0.58) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL8733301 0.79 ALDH1A1 (0.49) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL12552556 0.77 ALDH1A1 (0.50) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL3024023 0.74 APP (0.66) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL10053401 0.73 ALDH1A1 (0.59) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL2616778 0.71 APP (0.67) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL10053398 0.71 ALDH1A1 (0.60) ALDH1A1APPHSD17B10MEN1MAPT
SCHEMBL31085112 0.70 UGT2B7 (0.39) ALDH1A1MEN1KMT2AL3MBTL1HPGD
SCHEMBL917833 0.69 ALDH1A1 (0.59) ALDH1A1APPHSD17B10MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9766502-B2 Method for fabricating a photolytic alignment film comprising the step of rinsing a substrate using a cleaning agent to remove at least a non-polymer decomposition product, liquid crystal display panel and display device shanghai Tianma Micro-Electronics Co., LTD (CN) 2017-09-19 — — US disclosed
US-9766502-B2 Method for fabricating a photolytic alignment film comprising the step of rinsing a substrate using a cleaning agent to remove at least a non-polymer decomposition product, liquid crystal display panel and display device shanghai Tianma Micro-Electronics Co., LTD (CN) 2017-09-19 — — US disclosed
US-20150378218-A1 METHOD FOR FABRICATING PHOTOLYTIC ALIGNMENT FILM, LIQUID CRYSTAL DISPLAY PANEL AND DISPLAY DEVICE shanghai Tianma Micro-Electronics Co., LTD (CN) 2015-12-31 — — US disclosed
US-20150378218-A1 METHOD FOR FABRICATING PHOTOLYTIC ALIGNMENT FILM, LIQUID CRYSTAL DISPLAY PANEL AND DISPLAY DEVICE shanghai Tianma Micro-Electronics Co., LTD (CN) 2015-12-31 — — US disclosed
Send feedback