SCHEMBL1739262

SCHEMBL1739262

CC(=O)Oc1ccc(C2CC3C=CC2C3)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.43
HSD17B10 Q99714 2/20 0.41
MAPT P10636 4/20 0.40
POLB P06746 1/20 0.40
PKM P14618 1/20 0.40
KMT2A Q03164 4/20 0.40
MEN1 O00255 2/20 0.40
KDM4E B2RXH2 1/20 0.40
TTR P02766 1/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ELANE P08246 1/20 0.39
CUL4A Q13619 1/20 0.39
GLA P06280 1/20 0.39
EPHX2 P34913 1/20 0.38
ESR1 P03372 1/20 0.38
PGR P06401 1/20 0.38
CHRM2 P08172 1/20 0.38
ADORA3 P0DMS8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3292358 0.97 HSD17B10 (0.46) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3292302 0.94 ELANE (0.49) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3295278 0.92 LMNA (0.37) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3297791 0.92 HSD17B10 (0.42) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3292272 0.92 ELANE (0.39) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3291051 0.91 KDM1A (0.37) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3292906 0.89 LMNA (0.35) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL3296262 0.88 LMNA (0.34) LMNAHSD17B10MAPTPOLBPKM
SCHEMBL15698038 0.88 KDM4E (0.42) LMNAHSD17B10MAPTPOLBKMT2A
SCHEMBL15698004 0.85 KDM4E (0.40) LMNAHSD17B10MAPTPOLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250110399-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
WO-2025072607-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO claimed
US-20250110403-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
WO-2025072614-A2 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO claimed
US-10712661-B2 Negative tone photosensitive compositions PROMERUS, LLC (US) 2020-07-14 US claimed
US-20170357156-A1 NEGATIVE TONE PHOTOSENSITIVE COMPOSITIONS PROMERUS, LLC (US) 2017-12-14 US claimed
US-8753790-B2 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom PROMERUS, LLC (US) 2014-06-17 US claimed
WO-2025072607-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO disclosed
US-20250110399-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US disclosed
WO-2025072614-A2 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO disclosed
US-20250110403-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US disclosed
US-11692056-B2 Stable polycycloolefin polymer and inorganic nanoparticle compositions as optical materials PROMERUS, LLC (US) 2023-07-04 US disclosed
US-11692056-B2 Stable polycycloolefin polymer and inorganic nanoparticle compositions as optical materials PROMERUS, LLC (US) 2023-07-04 US disclosed
US-20120129101-A1 Self-Imageable Film Forming Polymer, Compositions Thereof and Devices and Structures Made Therefrom PROMERUS LLC (US) 2012-05-24 US disclosed
EP-2390690-A1 INVERSELY DISPERSIVE RETARDATION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING SAME JX Nippon Oil & Energy Corporation (JP) 2011-11-30 EP disclosed
US-20110104614-A1 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom PROMERUS LLC 2011-05-05 US disclosed
US-7759439-B2 Use of a combination chain transfer and activating agent to control molecular weight and optical density of Pd catalyzed norbornene polymers PROMERUS LLC (US) 2010-07-20 US disclosed
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US disclosed
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO disclosed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US disclosed