SCHEMBL3292302

SCHEMBL3292302

CC(=O)Oc1ccc(C(=O)c2ccc(C3CC4C=CC3C4)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 8/20 0.49
HSD17B10 Q99714 1/20 0.44
ESR1 P03372 1/20 0.40
PGR P06401 1/20 0.40
CHRM2 P08172 1/20 0.40
ADORA3 P0DMS8 1/20 0.40
AR P10275 1/20 0.40
CHRM1 P11229 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A3 Q01959 1/20 0.40
LMNA P02545 4/20 0.39
POLB P06746 2/20 0.39
PKM P14618 2/20 0.39
HTT P42858 1/20 0.39
RECQL P46063 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
EPHX2 P34913 1/20 0.37
MAPT P10636 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1739262 0.94 LMNA (0.43) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3297791 0.92 HSD17B10 (0.42) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3292358 0.92 HSD17B10 (0.46) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL8686930 0.87 LMNA (0.37) ESR1LMNAPOLBPKMHTT
SCHEMBL3292272 0.87 ELANE (0.39) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3295278 0.87 LMNA (0.37) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3291051 0.86 KDM1A (0.37) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3292906 0.84 LMNA (0.35) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL3296262 0.83 LMNA (0.34) ELANEHSD17B10ESR1PGRCHRM2
SCHEMBL15698038 0.83 KDM4E (0.42) HSD17B10LMNAPOLBTDP1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US disclosed
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO disclosed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US disclosed