SCHEMBL3292272

SCHEMBL3292272

CC(=O)Oc1ccc(Cc2ccc(C3CC4C=CC3C4)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.39
ALDH1A1 P00352 1/20 0.38
HPGD P15428 1/20 0.38
LMNA P02545 2/20 0.37
HSD17B10 Q99714 1/20 0.36
ESR1 P03372 1/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
AR P10275 1/20 0.36
CHRM1 P11229 1/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A3 Q01959 1/20 0.36
MAPT P10636 2/20 0.35
POLB P06746 2/20 0.35
PKM P14618 1/20 0.35
KMT2A Q03164 4/20 0.35
MEN1 O00255 2/20 0.35
KDM4E B2RXH2 1/20 0.35
TTR P02766 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1739262 0.92 LMNA (0.43) ELANEALDH1A1HPGDLMNAHSD17B10
SCHEMBL3292358 0.89 HSD17B10 (0.46) ELANEALDH1A1LMNAHSD17B10ESR1
SCHEMBL3292302 0.87 ELANE (0.49) ELANELMNAHSD17B10ESR1PGR
SCHEMBL3295278 0.85 LMNA (0.37) ELANEALDH1A1HPGDLMNAHSD17B10
SCHEMBL3297791 0.85 HSD17B10 (0.42) ELANELMNAHSD17B10ESR1PGR
SCHEMBL3291051 0.84 KDM1A (0.37) ELANEALDH1A1LMNAHSD17B10ESR1
SCHEMBL3292223 0.82 KDM4E (0.39) ELANEALDH1A1HPGDLMNAHSD17B10
SCHEMBL3291384 0.82 ELANE (0.39) ELANEALDH1A1HPGDLMNAHSD17B10
SCHEMBL19689476 0.82 ALDH1A1 (0.35) ALDH1A1HPGDLMNASLC6A2SLC6A3
SCHEMBL3292906 0.81 LMNA (0.35) ELANEALDH1A1LMNAHSD17B10ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US disclosed
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO disclosed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US disclosed