SCHEMBL17399699

SCHEMBL17399699

Cc1ccc(C(OC(=O)OC(C)(C)C)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPSR1 Q6W5P4 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ LMNA P02545 3/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ CA2 P00918 2/20 0.39
▸ MAPT P10636 2/20 0.37
▸ ELANE P08246 1/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ MLYCD O95822 1/20 0.37
▸ HTT P42858 1/20 0.36
▸ TSHR P16473 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA5A P35218 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ CYP1A1 P04798 1/20 0.35
▸ CYP1B1 Q16678 1/20 0.35
▸ GPR119 Q8TDV5 1/20 0.34
▸ RORC P51449 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14086284 0.93 ELANE (0.41) NPSR1KMT2ALMNAMEN1ALDH1A1
SCHEMBL25011409 0.85 CYP2C19 (0.42) NPSR1KMT2ALMNAALDH1A1MAPT
SCHEMBL26532176 0.85 CA2 (0.40) NPSR1KMT2ALMNAMEN1ALDH1A1
SCHEMBL12009253 0.83 NPC1 (0.38) NPSR1KMT2AMEN1ALDH1A1MAPT
SCHEMBL6864370 0.81 ELANE (0.33) NPSR1LMNAALDH1A1MAPTELANE
SCHEMBL14509286 0.81 RORC (0.37) NPSR1LMNAMAPTELANEHTT
SCHEMBL14515734 0.81 ELANE (0.33) NPSR1LMNAMAPTELANERORC
SCHEMBL13382474 0.80 PGK1 (0.41) NPSR1KMT2AMEN1ALDH1A1ELANE
SCHEMBL26532178 0.78 PGK1 (0.36) NPSR1ELANE
SCHEMBL10127493 0.78 ALDH1A1 (0.40) NPSR1KMT2ALMNAMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230037301-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-02-09 — — US disclosed
EP-1536285-B1 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORP (JP) 2016-01-06 — — EP disclosed
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