SCHEMBL17429416

SCHEMBL17429416

CCC(C)c1ccc(O)c(F)c1F

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.53
▸ RORC P51449 1/20 0.49
▸ USP2 O75604 1/20 0.42
▸ ALDH1A1 P00352 1/20 0.42
▸ GAA P10253 1/20 0.42
▸ PKM P14618 1/20 0.42
▸ HPGD P15428 1/20 0.42
▸ ALOX15 P16050 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ ADRB2 P07550 2/20 0.40
▸ ADRB1 P08588 2/20 0.40
▸ ADRB3 P13945 2/20 0.40
▸ ADRA2A P08913 3/20 0.39
▸ ADRA2B P18089 3/20 0.39
▸ ADRA2C P18825 3/20 0.39
▸ ADRA1A P35348 2/20 0.39
▸ ADRA1B P35368 1/20 0.39
▸ HSP90AA1 P07900 1/20 0.37
▸ HSP90AB1 P08238 1/20 0.37
▸ HDAC4 P56524 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10780955 0.85 TSHR (0.50) TSHRRORCUSP2ALDH1A1GAA
SCHEMBL17469343 0.81 TSHR (0.43) TSHRRORCHPGDADRA1AGABRA1
SCHEMBL19629265 0.79 TSHR (0.42) TSHRRORC
SCHEMBL20443883 0.79 ADRA1A (0.45) TSHRALDH1A1GAAHPGDADRB2
SCHEMBL12374304 0.78 TSHR (0.41) TSHRRORC
SCHEMBL10302847 0.77 ADRB2 (0.43) TSHRALOX15HSD17B10ADRB2ADRB1
SCHEMBL18885180 0.76 RORC (0.58) TSHRRORCUSP2ALDH1A1GAA
SCHEMBL10382254 0.76 ADRB2 (0.37) TSHRRORCALDH1A1GAAADRB2
SCHEMBL16117022 0.76 TSHR (0.44) TSHRRORCADRB2ADRB1ADRB3
SCHEMBL2382143 0.75 TSHR (0.57) TSHRRORCUSP2ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9804492-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-31 — — US disclosed
US-9785049-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-10 — — US disclosed
US-20170199457-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-13 — — US disclosed
US-9658530-B2 Process for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 — — US disclosed
US-20160111287-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-21 — — US disclosed
US-20160008844-A1 PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-14 — — US disclosed
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