SCHEMBL17515664

SCHEMBL17515664

CCC(C)c1ccc(S(=O)(=O)C(=O)S(=O)(=O)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
KDM4E B2RXH2 1/20 0.47
TSHR P16473 2/20 0.46
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
MCL1 Q07820 1/20 0.43
LMNA P02545 1/20 0.43
CASP1 P29466 1/20 0.42
OPRK1 P41145 1/20 0.42
HDAC4 P56524 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CHRM2 P08172 1/20 0.40
CHRM1 P11229 1/20 0.40
SCN3A Q9NY46 1/20 0.40
HSD11B1 P28845 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10179993 0.83 HTR6 (0.52) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL2740711 0.83 MEN1 (0.46) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL2740714 0.82 ALDH1A1 (0.41) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL10178756 0.80 PSIP1 (0.52) ALDH1A1KDM4ETSHRMEN1KMT2A
Bicarbonate SCHEMBL6219599 0.77 TRPA1 (0.55) ALDH1A1TSHRMEN1KMT2ALMNA
SCHEMBL7266697 0.76 SMN1; SMN2 (0.55) ALDH1A1TSHRKMT2ALMNASMN1; SMN2
SCHEMBL12086454 0.75 MEN1 (0.51) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL10031603 0.75 MEN1 (0.51) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL116856 0.75 MEN1 (0.51) ALDH1A1KDM4ETSHRMEN1KMT2A
SCHEMBL13899615 0.75 MMP2 (0.53) ALDH1A1KDM4ETSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10031419-B2 Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device FUJIFILM CORPORATION (JP) 2018-07-24 US disclosed
US-20160048075-A1 PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-18 US disclosed