SCHEMBL17552675

SCHEMBL17552675

[SiH3]c1cc(Cl)cc(Cl)c1Cl

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.61
▸ AHR P35869 7/20 0.48
▸ TSHR P16473 6/20 0.48
▸ HSD17B10 Q99714 5/20 0.48
▸ HPGD P15428 4/20 0.48
▸ CYP3A4 P08684 4/20 0.41
▸ RECQL P46063 2/20 0.41
▸ CASP1 P29466 2/20 0.35
▸ CRHBP P24387 1/20 0.35
▸ CRHR2 Q13324 1/20 0.35
▸ TP53 P04637 1/20 0.35
▸ NOTUM Q6P988 1/20 0.33
▸ HTR3E A5X5Y0 1/20 0.32
▸ HTR3B O95264 1/20 0.32
▸ HTR3A P46098 1/20 0.32
▸ HTR3D Q70Z44 1/20 0.32
▸ HTR3C Q8WXA8 1/20 0.32
▸ KDM4E B2RXH2 1/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ SLC22A2 O15244 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL358001 0.77 ALDH1A1 (1.00) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL10488073 0.73 CYP3A4 (0.59) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL560391 0.71 ALDH1A1 (0.86) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL17552670 0.71 ALDH1A1 (0.53) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL2930780 0.69 ALDH1A1 (0.69) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL8165912 0.67 ALDH1A1 (0.75) ALDH1A1AHRTSHRHSD17B10HPGD
Methoxymethane SCHEMBL28100007 0.67 ALDH1A1 (0.75) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL4456478 0.67 ALDH1A1 (0.65) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL2937097 0.66 TSHR (0.67) ALDH1A1AHRTSHRHSD17B10HPGD
SCHEMBL17552706 0.65 ALDH1A1 (0.52) ALDH1A1AHRTSHRHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
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