Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 4/20 | 0.37 |
| ▸ | RAB9A | P51151 | 4/20 | 0.37 |
| ▸ | PKM | P14618 | 3/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | MGLL | Q99685 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | CDK5 | Q00535 | 3/20 | 0.36 |
| ▸ | CDK5R1 | Q15078 | 3/20 | 0.36 |
| ▸ | MITF | O75030 | 1/20 | 0.36 |
| ▸ | CHEK2 | O96017 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | TNF | P01375 | 1/20 | 0.35 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15960798 | 1.00 | POLB (0.37) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL17070002 | 1.00 | POLB (0.37) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL17069998 | 0.99 | POLB (0.39) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL31621087 | 0.99 | POLB (0.39) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL17540445 | 0.99 | POLB (0.39) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL17540446 | 0.95 | NPC1 (0.39) | POLBNPC1RAB9APKMSMN1; SMN2 | |
| SCHEMBL20015387 | 0.89 | CYSLTR2 (0.34) | POLBALDH1A1L3MBTL1LMNACHEK2 | |
| SCHEMBL25373230 | 0.89 | L3MBTL1 (0.44) | NPC1RAB9APKMSMN1; SMN2MAPT | |
| SCHEMBL17070001 | 0.89 | L3MBTL1 (0.44) | NPC1RAB9APKMSMN1; SMN2MAPT | |
| SCHEMBL19795438 | 0.89 | L3MBTL1 (0.44) | NPC1RAB9APKMSMN1; SMN2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 747 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | claimed |
| US-20260015799-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-01-15 | — | — | US | claimed |
| US-20250187036-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2025-06-12 | — | — | US | claimed |
| EP-4565378-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2025-06-11 | — | — | EP | claimed |
| CN-118829493-A | Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking | 锡克拜控股有限公司 | 2024-10-22 | — | — | CN | claimed |
| EP-4429872-A1 | VAT POLYMERIZATION PROCESS | Polyfos 3D Ltd (IL) | 2024-09-18 | — | — | EP | claimed |
| WO-2024028408-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-02-08 | — | — | WO | claimed |
| WO-2023084517-A1 | VAT POLYMERIZATION PROCESS | POLYFOS 3D LTD (IL) | 2023-05-19 | — | — | WO | claimed |
| CN-122072433-A | Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device | 日铁化学材料株式会社 | 2026-05-22 | — | — | CN | disclosed |
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | disclosed |
| US-12552888-B2 | Curable resin composition and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-02-17 | — | — | US | disclosed |
| US-12528983-B2 | Curable resin composition and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12522742-B2 | Photosensitive composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-12504564-B2 | Layered body and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-23 | — | — | US | disclosed |
| US-20170052448-A1 | RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| EP-3133445-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-3133444-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | OSAKA UNIVERSITY (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-3109703-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | Tokyo Electron Limited (JP) | 2016-12-28 | — | — | EP | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| EP-3002632-A1 | ACRYLIC PHOTOCURABLE COMPOSITION | Changzhou Tronly Advanced Electronics Materials Co., Ltd. (CN) | 2016-04-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12552888-B2 | Curable resin composition and display device | RAD51, LPO, FTO | POLB 1138/4885NPC1 4339/4885RAB9A 1099/4885 |
| US-12528983-B2 | Curable resin composition and display device | TIPRL, NLRP1, RCSD1 | POLB 4026/4885NPC1 3860/4885RAB9A 1179/4885 |
| US-20260015799-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | IK, TEX10, INCENP | POLB 1111/4885NPC1 843/4885RAB9A 1702/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.