Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | ATM | Q13315 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL11529581 | 0.86 | ALDH1A1 (0.41) | ALDH1A1LMNACES2CES1TDP1 | |
| Trifluoroacetic Acid SCHEMBL3285168 | 0.85 | MAPT (0.41) | ALDH1A1LMNACES2CES1TDP1 | |
| SCHEMBL12762110 | 0.84 | ACHE (0.57) | ALDH1A1LMNACES2CES1TDP1 | |
| SCHEMBL37146 | 0.84 | ACHE (0.57) | ALDH1A1LMNACES2CES1TDP1 | |
| Hydrochloric Acid SCHEMBL482494 | 0.81 | ACHE (0.53) | ALDH1A1LMNACES2CES1TDP1 | |
| Iodide SCHEMBL8433250 | 0.81 | ACHE (0.53) | ALDH1A1LMNACES2CES1TDP1 | |
| Hydrogen Sulfide SCHEMBL29644447 | 0.81 | ACHE (0.53) | ALDH1A1LMNACES2CES1TDP1 | |
| Water SCHEMBL1765019 | 0.81 | ACHE (0.53) | ALDH1A1LMNACES2CES1TDP1 | |
| Bromide SCHEMBL4916423 | 0.81 | ACHE (0.53) | ALDH1A1LMNACES2CES1TDP1 | |
| SCHEMBL8465333 | 0.80 | ACHE (0.52) | ALDH1A1LMNATDP1ACHEHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110122177-A1 | Ink Jet Recording Apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7896484-B2 | Ink jet recording apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | disclosed |
| US-7754785-B2 | Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20100105785-A1 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | SHEEHAN MICHAEL T | 2010-04-29 | — | — | US | disclosed |
| US-7662538-B2 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | Du Pont Electronic Polymers L.P. (US) | 2010-02-16 | — | — | US | disclosed |
| US-7579390-B2 | Inkjet ink composition and printed matters created using inkjet ink composition | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7500745-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-03-10 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-20080273066-A1 | Ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-0942329-B1 | NOVEL PROCESS FOR PREPARING RESISTS | CLARIANT FINANCE BVI LTD (VG) | 2002-11-13 | — | — | EP | disclosed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | disclosed |
| US-20010036589-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2001-11-01 | — | — | US | disclosed |
| US-20010024765-A1 | Novel process for preparing resists | MERCK PATENT GMBH (DE) | 2001-09-27 | — | — | US | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| US-6284427-B1 | Process for preparing resists | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-09-04 | — | — | US | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0942329-A1 | NOVEL PROCESS FOR PREPARING RESISTS | Clariant International Ltd. (CH) | 1999-09-15 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |