Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 17/20 | 0.40 |
| ▸ | CA1 | P00915 | 16/20 | 0.40 |
| ▸ | MMP1 | P03956 | 4/20 | 0.35 |
| ▸ | MMP2 | P08253 | 4/20 | 0.35 |
| ▸ | MMP9 | P14780 | 4/20 | 0.35 |
| ▸ | MMP8 | P22894 | 4/20 | 0.35 |
| ▸ | MMP13 | P45452 | 4/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3947658 | 0.88 | HSD11B1 (0.36) | CA2CA1HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL443422 | 0.82 | GPR3 (0.46) | CA2CA1HSD11B1 | |
| SCHEMBL5826459 | 0.78 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL546546 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL4535202 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL60437 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5567499 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Perflubutane SCHEMBL6325042 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL213386 | 0.76 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL60137 | 0.76 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109073973-B | Negative photoresist composition for KrF laser with high resolution and high aspect ratio | 荣昌化学制品株式会社 | 2021-09-28 | — | — | CN | claimed |
| EP-4194438-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | Samsung Electronics Co., Ltd. (KR) | 2023-06-14 | — | — | EP | disclosed |
| US-7968275-B2 | Method of forming a pattern using a photoresist composition for immersion lithography | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | disclosed |
| US-20090176177-A1 | METHOD OF FORMING A PATTERN USING A PHOTORESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SAMSUNG ELECTRONICS CO., LTD. | 2009-07-09 | — | — | US | disclosed |