Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | XDH | P47989 | 11/20 | 0.39 |
| ▸ | HSF1 | Q00613 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | TNF | P01375 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | NLRP3 | Q96P20 | 3/20 | 0.36 |
| ▸ | TLR4 | O00206 | 1/20 | 0.36 |
| ▸ | FAAH | O00519 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17736490 | 0.82 | CYP1A2 (0.38) | XDHHSF1FAAH | |
| SCHEMBL17736503 | 0.80 | CYP1A2 (0.37) | XDHHSF1NLRP3TLR4 | |
| SCHEMBL17736496 | 0.80 | CNR1 (0.48) | NPC1RAB9A | |
| SCHEMBL16381780 | 0.76 | XDH (0.50) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17736504 | 0.74 | FAAH (0.40) | XDHNLRP3FAAH | |
| SCHEMBL17736498 | 0.73 | FAAH (0.39) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17736493 | 0.72 | XDH (0.34) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17736497 | 0.72 | XDH (0.37) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17341928 | 0.71 | XDH (0.49) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17341906 | 0.70 | XDH (0.43) | XDHHSF1NPC1TNFRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |