SCHEMBL177995

SCHEMBL177995

C=C(C(N)=O)C(CCC)S(=O)(=O)O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 3/20 0.37
HDAC2 Q92769 3/20 0.37
TDP1 Q9NUW8 2/20 0.37
CHRM1 P11229 1/20 0.37
AKR1A1 P14550 1/20 0.37
CHRM3 P20309 1/20 0.37
HTR2A P28223 1/20 0.37
HTR2C P28335 1/20 0.37
ADRA1A P35348 1/20 0.37
HRH1 P35367 1/20 0.37
DRD3 P35462 1/20 0.37
SLC6A3 Q01959 1/20 0.37
CYP3A4 P08684 2/20 0.35
TSHR P16473 2/20 0.35
NFKB1 P19838 2/20 0.35
NPSR1 Q6W5P4 2/20 0.35
TP53 P04637 1/20 0.34
RECQL P46063 1/20 0.34
HDAC7 Q8WUI4 3/20 0.33
HDAC8 Q9BY41 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2784998 0.98 HDAC1 (0.35) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL1472171 0.86 TDP1 (0.33) TDP1RECQL
SCHEMBL9505681 0.84 HDAC1 (0.41) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL177826 0.84 TDP1 (0.32) TDP1RECQL
SCHEMBL27399020 0.81 HDAC1 (0.41) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL16053740 0.81 NFKB1 (0.45) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL28875767 0.79 TDP1 (0.48) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL9515820 0.77 RECQL (0.34) TP53RECQLCA1CA2
SCHEMBL10663178 0.75 RECQL (0.33) HDAC1HDAC2TDP1CHRM1AKR1A1
SCHEMBL4742989 0.75 CA2 (0.47) HDAC1HDAC2TDP1CHRM1AKR1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2386538-B1 N-(1-HYDROXYETHYL)CARBOXAMIDE COMPOUND AND PROCESS FOR PRODUCING SAME SHOWA DENKO KK (JP) 2015-07-29 EP disclosed
US-8697912-B2 N-(1-hydroxyethyl) carboxamide compound and process for producing same SHOWA DENKO K.K. (JP) 2014-04-15 US disclosed
US-20110294974-A1 N-(1-HYDROXYETHYL ) CARBOXAMIDE COMPOUND AND PROCESS FOR PRODUCING SAME SHOWA DENKO K.K. (JP) 2011-12-01 US disclosed
EP-2386538-A1 N-(1-HYDROXYETHYL)CARBOXAMIDE COMPOUND AND PROCESS FOR PRODUCING SAME Showa Denko K.K. (JP) 2011-11-16 EP disclosed
EP-1606433-A1 PROCESS FOR MANUFACTURE OF PROTON CONDUCTIVE POLYMER GEL USEFUL AS BACKFILL FOR SACRIFICIAL AND IMPRESSED CURRENT ANODE SYSTEMS COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) 2005-12-21 EP disclosed
US-6838525-B2 Process for manufacture of proton conductive polymer gel useful as backfill for sacrificial and impressed current anode systems CONCEIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) 2005-01-04 US disclosed
US-20040186221-A1 Process for manufacture of proton conductive polymer gel useful as backfill for sacrificial and impressed current anode systems COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) 2004-09-23 US disclosed
WO-2004057057-A1 PROCESS FOR MANUFACTURE OF PROTON CONDUCTIVE POLYMER GEL USEFUL AS BACKFILL FOR SACRIFICIAL AND IMPRESSED CURRENT ANODE SYSTEMS COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) 2004-07-08 WO disclosed
EP-0473881-B1 Liquid absorption agent SHOWA DENKO KK (JP) 2001-11-07 EP disclosed
US-6166253-A Process for producing N-(1-alkoxyethyl)carboxylic amides SHOWA DENKO K.K. (JP) 2000-12-26 US disclosed
US-5788950-A Method for the synthesis of mixed metal oxide powders SHOWA DENKO K.K. (JP) 1998-08-04 US disclosed
US-5744118-A MIXING ABSORBENT RESIN AND METAL SALTS, SWELLING AND GELATION, ADJUSTMENT OF PH, PYROLYSIS AND ROASTING SHOWA DENKO K.K. (JP) 1998-04-28 US disclosed
EP-0799820-A1 Process producing n-(1-alkoxyethyl)carboxylic amides SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-10-08 EP disclosed
EP-0510246-B1 Use of fine particulate crosslinked type n-vinylamide resin microgel SHOWA DENKO KK (JP) 1996-09-25 EP disclosed
US-5407996-A Contacting with an aqueous solution of metal ion or metal oxide to form a gel; calcining SHOWA DENKO K.K. (JP) 1995-04-18 US disclosed
US-5338815-A Used in thickeners, dispersion stabilizers and lubricants SHOWA DENKO K.K. (JP) 1994-08-16 US disclosed
US-5300606-A Crosslinked N-vinylamide resin SHOWA DENKO K.K. (JP) 1994-04-05 US disclosed
US-5280095-A N-vinylcarboxylic acid amine resin SHOWA DENKO K.K. (JP) 1994-01-18 US disclosed
EP-0510246-A1 Use of fine particulate crosslinked type n-vinylamide resin microgel SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-10-28 EP disclosed
EP-0473881-A1 Liquid absorption agent SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-03-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294974-A1 N-(1-HYDROXYETHYL ) CARBOXAMIDE COMPOUND AND PROCESS FOR PRODUCING SAME ADH1A, ADH1C, CNKSR1 HDAC1 20/4885HDAC2 68/4885TDP1 1472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.