Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 6/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | GFER | P55789 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | NPY2R | P49146 | 1/20 | 0.33 |
| ▸ | PANK3 | Q9H999 | 1/20 | 0.33 |
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17812642 | 0.85 | NAAA (0.33) | L3MBTL1CYP19A1NPC1ALDH1A1MAPT | |
| SCHEMBL18911195 | 0.81 | ALDH1A1 (0.46) | L3MBTL1CYP19A1ALDH1A1MAPTHPGD | |
| SCHEMBL14665303 | 0.80 | L3MBTL1 (0.43) | ELANEL3MBTL1NPC1ALDH1A1MAPT | |
| SCHEMBL17812759 | 0.80 | ELANE (0.43) | ELANEALDH1A1NPY2RHRH3 | |
| SCHEMBL17812750 | 0.79 | CHRM2 (0.42) | ELANENPC1ALDH1A1MAPTRAB9A | |
| SCHEMBL18905382 | 0.77 | CYP19A1 (0.37) | L3MBTL1CYP19A1ALDH1A1MAPTHPGD | |
| SCHEMBL14747377 | 0.75 | ELANE (0.51) | ELANEL3MBTL1MAPTHRH3 | |
| SCHEMBL15497373 | 0.74 | MAPT (0.50) | ELANEL3MBTL1ALDH1A1MAPTRAB9A | |
| SCHEMBL27428780 | 0.74 | ELANE (0.50) | ELANEL3MBTL1MAPTHRH3 | |
| SCHEMBL15179672 | 0.74 | ELANE (0.50) | ELANEL3MBTL1NPC1MAPTRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160161850-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |