Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17830209 | 0.88 | ALDH1A1 (0.32) | MMP8 | |
| SCHEMBL17830194 | 0.88 | ALDH1A1 (0.32) | MMP8 | |
| SCHEMBL17830216 | 0.86 | — | — | |
| SCHEMBL17832152 | 0.86 | PRKCA (0.40) | PRKCA | |
| SCHEMBL17830189 | 0.78 | ALDH1A1 (0.39) | — | |
| SCHEMBL18924548 | 0.77 | PRKCA (0.39) | PRKCA | |
| SCHEMBL17830188 | 0.76 | PRKCA (0.43) | PRKCA | |
| SCHEMBL17830196 | 0.76 | — | — | |
| SCHEMBL17832161 | 0.76 | PRKCA (0.35) | PRKCA | |
| SCHEMBL17832155 | 0.75 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |