SCHEMBL17832161

SCHEMBL17832161

CCC(C)(COC(=O)C(C)(C)C)C(=O)OCC(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17832157 0.90 PRKCA (0.33) PRKCA
SCHEMBL17832176 0.88 ALDH1A1 (0.33)
SCHEMBL2693201 0.87 PRKCA (0.38) PRKCA
SCHEMBL17832172 0.87 NAAA (0.30)
SCHEMBL17830207 0.80 PRKCA (0.33) PRKCA
SCHEMBL17830205 0.80 PRKCA (0.33) PRKCA
SCHEMBL2170271 0.79 PRKCA (0.41) PRKCA
SCHEMBL25753306 0.79
SCHEMBL10181613 0.78 CYP4F2 (0.34)
SCHEMBL12939354 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed