Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17832149 | 0.87 | ALDH1A1 (0.32) | PRKCA | |
| SCHEMBL17832151 | 0.86 | — | — | |
| SCHEMBL17830203 | 0.86 | PRKCA (0.39) | PRKCA | |
| SCHEMBL17832155 | 0.86 | ALDH1A1 (0.32) | — | |
| SCHEMBL19135829 | 0.84 | PRKCA (0.32) | PRKCA | |
| SCHEMBL18591144 | 0.78 | PRKCA (0.33) | PRKCA | |
| SCHEMBL904347 | 0.78 | CA1 (0.31) | — | |
| SCHEMBL22051424 | 0.78 | — | — | |
| SCHEMBL17832154 | 0.78 | ALDH1A1 (0.40) | — | |
| SCHEMBL17832161 | 0.77 | PRKCA (0.35) | PRKCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |