SCHEMBL17830209

SCHEMBL17830209

CCC(C)(COC(C)=O)C(=O)OC(C)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.32
LMNA P02545 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TSHR P16473 1/20 0.31
MMP8 P22894 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17830194 0.88 ALDH1A1 (0.32) ALDH1A1MMP8
SCHEMBL17830203 0.88 PRKCA (0.39) MMP8
SCHEMBL17830216 0.86
SCHEMBL17832149 0.86 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10TDP1TSHR
SCHEMBL17830189 0.78 ALDH1A1 (0.39) ALDH1A1LMNATSHR
SCHEMBL17830188 0.76 PRKCA (0.43) ALDH1A1LMNA
SCHEMBL13290527 0.76 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10TSHRMMP8
SCHEMBL17830196 0.76
SCHEMBL17832155 0.75 ALDH1A1 (0.32) ALDH1A1
SCHEMBL107004 0.74 MMP8 (0.33) MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed