SCHEMBL17832149

SCHEMBL17832149

CCC(C)(COC(C)=O)C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.32
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
TSHR P16473 1/20 0.32
PRKCA P17252 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17832152 0.87 PRKCA (0.40) PRKCA
SCHEMBL17830209 0.86 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10TDP1TSHR
SCHEMBL17832155 0.86 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17832151 0.86
SCHEMBL19135829 0.84 PRKCA (0.32) PRKCA
SCHEMBL18591144 0.78 PRKCA (0.33) PRKCA
SCHEMBL22051424 0.78
SCHEMBL904347 0.78 CA1 (0.31) LMNAHSD17B10
SCHEMBL17832154 0.78 ALDH1A1 (0.40) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL13290527 0.77 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed