SCHEMBL17832172

SCHEMBL17832172

CCC(=O)OCC(C)(CC)C(=O)OCC(F)(F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17832161 0.87 PRKCA (0.35)
SCHEMBL17832176 0.85 ALDH1A1 (0.33)
SCHEMBL2692003 0.84 NAAA (0.39) NAAA
SCHEMBL17832114 0.80
SCHEMBL17830215 0.79 NAAA (0.33) NAAA
SCHEMBL17832157 0.77 PRKCA (0.33)
SCHEMBL17832151 0.76
SCHEMBL25753306 0.76
SCHEMBL13760128 0.76 FGFR1 (0.33)
SCHEMBL10181613 0.75 CYP4F2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed