SCHEMBL17832176

SCHEMBL17832176

CCC(C)(COC(C)=O)C(=O)OCC(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17832161 0.88 PRKCA (0.35)
SCHEMBL17832172 0.85 NAAA (0.30)
SCHEMBL5356743 0.82 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10
SCHEMBL9247480 0.80 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10
SCHEMBL17832113 0.79
SCHEMBL17832157 0.79 PRKCA (0.33)
SCHEMBL17830211 0.79 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10
SCHEMBL13290527 0.78 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10
SCHEMBL25753306 0.77
SCHEMBL10181613 0.77 CYP4F2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed