SCHEMBL22503271

SCHEMBL22503271

Nc1ccc(C(=O)NS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 4/20 0.50
LMNA P02545 3/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
POLB P06746 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
PKM P14618 1/20 0.47
APEX1 P27695 1/20 0.47
CA1 P00915 3/20 0.45
CA2 P00918 3/20 0.45
CA12 O43570 1/20 0.45
CA9 Q16790 1/20 0.45
SCN5A Q14524 1/20 0.44
SCN9A Q15858 1/20 0.44
KDM4E B2RXH2 1/20 0.43
MAPT P10636 1/20 0.43
HIF1A Q16665 1/20 0.43
SLC22A6 Q4U2R8 1/20 0.43
SLC22A8 Q8TCC7 1/20 0.43
PRMT1 Q99873 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503135 0.84 SCN5A (0.57) PTGS1KMT2ASCN5ASCN9AKDM4E
SCHEMBL22503128 0.84 PTGS2 (0.49) PTGS1MEN1KMT2ACA1CA2
SCHEMBL22503140 0.84 MPO (0.47) PTGS1LMNAMEN1KMT2APKM
SCHEMBL26163078 0.82 OGG1 (0.48) PTGS1TDP1CA1CA2CA12
SCHEMBL22503116 0.82 FLT1 (0.59) PTGS1LMNAMEN1KMT2APOLB
SCHEMBL22503119 0.82 TRPV1 (0.50) CA1CA2SCN5ASCN9AVCP
SCHEMBL22503309 0.82 HDAC1 (0.55) LMNAMEN1KMT2APOLBCA1
SCHEMBL178335 0.81 HDAC3 (0.52) LMNAMEN1KMT2ACA1CA12
SCHEMBL22503319 0.81 LMNA (0.49) LMNAMEN1KMT2ASCN5ASCN9A
SCHEMBL22503299 0.81 HDAC1 (0.59) LMNAMEN1KMT2APOLBCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed