SCHEMBL17879755

SCHEMBL17879755

O=C(CCC(O)(C(F)(F)F)C(F)(F)F)Nc1cc(S(=O)(=O)O)ccc1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.49
ALDH1A1 P00352 7/20 0.40
POLB P06746 1/20 0.40
CA1 P00915 7/20 0.40
CA2 P00918 7/20 0.40
GAA P10253 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
LMNA P02545 1/20 0.39
CA9 Q16790 6/20 0.39
CA12 O43570 2/20 0.39
APOBEC3G Q9HC16 1/20 0.39
CA7 P43166 1/20 0.38
CA4 P22748 1/20 0.38
KDM4E B2RXH2 1/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17883725 0.77 ACP1 (0.42) POLBCA1CA2MEN1KMT2A
SCHEMBL6004444 0.73 TDP1 (0.51) TDP1ALDH1A1POLBCA1CA2
SCHEMBL9001663 0.71 CASP6 (0.57) TDP1ALDH1A1POLBCA1CA2
SCHEMBL17879753 0.71 ACP1 (0.37) ALDH1A1POLBCA1CA2MEN1
SCHEMBL17879762 0.71 ALDH1A1 (0.47) TDP1ALDH1A1POLBCA1CA2
SCHEMBL17879751 0.69 HSD17B10 (0.38) ALDH1A1POLBLMNAKDM4EHPGD
SCHEMBL28806135 0.69 ALDH1A1 (0.50) TDP1ALDH1A1POLBCA1CA2
SCHEMBL10589587 0.68 ALDH1A1 (0.52) TDP1ALDH1A1CA1CA2MEN1
SCHEMBL11022268 0.67 APEX1 (0.71) CA1CA2GAAMEN1KMT2A
SCHEMBL8752027 0.66 ALDH1A1 (0.58) TDP1ALDH1A1CA1CA2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-06-26 US disclosed
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-06-26 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, ADH1C, FPR1 TDP1 895/4885ALDH1A1 90/4885POLB 344/4885
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, PUF60, PARG TDP1 826/4885ALDH1A1 189/4885POLB 106/4885
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, PUF60, PARG TDP1 826/4885ALDH1A1 189/4885POLB 106/4885
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, ADH1C, FPR1 TDP1 895/4885ALDH1A1 90/4885POLB 344/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.