SCHEMBL17879783

SCHEMBL17879783

O=C(OCCC(O)(C(F)(F)F)C(F)(F)F)c1cc(S(=O)(=O)O)c2ccccc2c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 9/20 0.39
TDP1 Q9NUW8 5/20 0.39
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
HPGD P15428 2/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
ATM Q13315 2/20 0.37
NPC1 O15118 1/20 0.35
CYP1A2 P05177 1/20 0.34
CYP2C9 P11712 1/20 0.34
ALOX15 P16050 1/20 0.34
ATIC P31939 1/20 0.34
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
HSD17B10 Q99714 1/20 0.34
POLB P06746 1/20 0.33
RORA P35398 1/20 0.33
RORC P51449 1/20 0.33
NR1H2 P55055 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17879734 0.92 L3MBTL1 (0.35) L3MBTL1TDP1ALDH1A1KDM4EHPGD
SCHEMBL17883728 0.91 RAB9A (0.36) L3MBTL1TDP1ALDH1A1KDM4EHPGD
SCHEMBL17879737 0.90 L3MBTL1 (0.33) L3MBTL1TDP1ALDH1A1KDM4EHPGD
SCHEMBL17879750 0.87 TTR (0.36) L3MBTL1TDP1ALDH1A1KDM4EHPGD
SCHEMBL17879729 0.87 RAB9A (0.36) L3MBTL1TDP1ALDH1A1KDM4EHPGD
SCHEMBL17879746 0.82 SERPINE1 (0.33) TDP1ALDH1A1
SCHEMBL17879763 0.82 KCNJ11 (0.32) MPL
SCHEMBL20117656 0.80
SCHEMBL17883517 0.79 CNR1 (0.35)
SCHEMBL20110624 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-06-26 US disclosed
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-06-26 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, ADH1C, FPR1 L3MBTL1 2855/4885TDP1 895/4885ALDH1A1 90/4885
US-10007179-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, PUF60, PARG L3MBTL1 4644/4885TDP1 826/4885ALDH1A1 189/4885
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, PUF60, PARG L3MBTL1 4644/4885TDP1 826/4885ALDH1A1 189/4885
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, ADH1C, FPR1 L3MBTL1 2855/4885TDP1 895/4885ALDH1A1 90/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.