SCHEMBL1789802

SCHEMBL1789802

[c]1ccc2c(c1)Cc1ccccc1C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.40
DRD2 P14416 1/20 0.38
DRD1 P21728 1/20 0.38
DRD4 P21917 1/20 0.38
DRD5 P21918 1/20 0.38
DRD3 P35462 1/20 0.38
MAOA P21397 2/20 0.37
MAOB P27338 1/20 0.37
ALOX15 P16050 1/20 0.37
HSD17B10 Q99714 1/20 0.37
HTR2A P28223 3/20 0.34
CYP2A6 P11509 1/20 0.34
TSHR P16473 2/20 0.32
CYP3A4 P08684 1/20 0.32
HTR2C P28335 1/20 0.31
HRH1 P35367 1/20 0.31
TRPA1 O75762 1/20 0.30
KDM4E B2RXH2 1/20 0.30
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6038298 0.92
SCHEMBL7660152 0.89 CYP2A6 (0.45) CYP1A2DRD2DRD1DRD4DRD5
SCHEMBL24206 0.79 MAOA (0.46) CYP1A2DRD1DRD3MAOAMAOB
SCHEMBL24657 0.79 MAOA (0.46) CYP1A2DRD1DRD3MAOAMAOB
SCHEMBL20400573 0.78 CYP1A2 (0.50) CYP1A2CYP2A6
Water SCHEMBL2528680 0.78
SCHEMBL195110 0.74 MAOA (0.65) MAOAMAOBNPC1LMNARAB9A
SCHEMBL2747424 0.74 ALDH1A1 (0.46) CYP1A2MAOAMAOBALOX15CYP3A4
SCHEMBL2747368 0.74 ALDH1A1 (0.46) CYP1A2DRD1DRD3MAOAMAOB
SCHEMBL194519 0.74 MAOA (0.65) MAOAMAOBNPC1LMNARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12024595-B2 Polymer composition BASF SE (DE) 2024-07-02 US disclosed
EP-3215558-B1 NOVEL POLYMER COMPOSITIONS AND USE OF THESE POLYMER COMPOSITIONS AS DISPERSANTS BASF SE (DE) 2023-01-11 EP disclosed
EP-3837301-B1 POLYMER COMPOSITION BASF SE (DE) 2022-06-15 EP disclosed
CN-109863185-B Novel monomers and polymers 巴斯夫欧洲公司 2022-05-10 CN disclosed
US-20210347950-A1 POLYMER COMPOSITION BASF SE (DE) 2021-11-11 US disclosed
US-11053334-B2 Monomers and polymers BASF SE (DE) 2021-07-06 US disclosed
EP-3837301-A1 POLYMER COMPOSITION BASF SE (DE) 2021-06-23 EP disclosed
CN-112912420-A Polymer composition 巴斯夫欧洲公司 2021-06-04 CN disclosed
EP-3535307-B1 NOVEL MONOMERS AND POLYMERS BASF SE (DE) 2021-02-24 EP disclosed
CN-107075243-B Polymer compositions and use of these polymer compositions as dispersants 巴斯夫欧洲公司 2020-09-22 CN disclosed
US-20160102198-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2016-04-14 US disclosed
EP-3004215-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2016-04-13 EP disclosed
US-20150038640-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2015-02-05 US disclosed
WO-2015011085-A1 NOVEL POLYMERS AND USE OF THESE AS DISPERSANTS BASF SE (DE) 2015-01-29 WO disclosed
EP-2817358-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2014-12-31 EP disclosed
WO-2014195440-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2014-12-11 WO disclosed
US-8546059-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-01 US disclosed
WO-2013124830-A1 NOVEL POLYMER DISPERSANTS BASF SE (DE) 2013-08-29 WO disclosed
CN-102081303-A Photoresist composition SUMITOMO CHEMICAL CO 2011-06-01 CN disclosed
US-20110123926-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-26 US disclosed