Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNMA1 | Q12791 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 6/20 | 0.43 |
| ▸ | MGAM | O43451 | 5/20 | 0.43 |
| ▸ | AMY1A | P0DUB6 | 5/20 | 0.43 |
| ▸ | SI | P14410 | 5/20 | 0.43 |
| ▸ | MGAM2 | Q2M2H8 | 5/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | HCAR3 | P49019 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.38 |
| ▸ | TUBB | P07437 | 1/20 | 0.38 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.38 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.38 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.38 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.38 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18033712 | 0.83 | HCAR3 (0.60) | HCAR3HPGDHCAR2 | |
| SCHEMBL10428733 | 0.83 | KCNMA1 (0.62) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL1161341 | 0.82 | KCNMA1 (0.50) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL14639695 | 0.81 | GAA (0.54) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL31666989 | 0.80 | KCNMA1 (0.53) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL1161338 | 0.80 | KCNMA1 (0.53) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL11440840 | 0.79 | KCNMA1 (0.61) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL4054573 | 0.79 | KCNMA1 (0.61) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL24019555 | 0.77 | KCNMA1 (0.59) | KCNMA1GAAMGAMAMY1ASI | |
| SCHEMBL10428583 | 0.77 | KCNMA1 (0.59) | KCNMA1GAAMGAMAMY1ASI |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-9740098-B2 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9720323-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160299428-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |
| US-20160246175-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-25 | — | — | US | disclosed |