Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 6/20 | 0.34 |
| ▸ | PPARA | Q07869 | 5/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 3/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.32 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.32 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.32 |
| ▸ | FOXM1 | Q08050 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18120331 | 0.99 | PPARG (0.34) | PPARGPPARAHPGDKDM4EALDH1A1 | |
| SCHEMBL18961217 | 0.79 | SLC7A5 (0.40) | KDM4EALDH1A1 | |
| SCHEMBL18120330 | 0.78 | CHRNB2 (0.35) | HPGDKDM4EALDH1A1NPC1RAB9A | |
| SCHEMBL18961216 | 0.78 | SLC7A5 (0.40) | KDM4EALDH1A1 | |
| SCHEMBL685739 | 0.77 | PPARG (0.38) | PPARGPPARAHPGDALDH1A1NPC1 | |
| SCHEMBL18120335 | 0.74 | ALDH1A1 (0.35) | HPGDKDM4EALDH1A1NPC1RAB9A | |
| SCHEMBL6757935 | 0.73 | PPARG (0.36) | PPARGPPARAHPGDALDH1A1NPC1 | |
| SCHEMBL12159411 | 0.73 | SMN1; SMN2 (0.37) | HPGDKDM4EALDH1A1NPC1RAB9A | |
| SCHEMBL18120334 | 0.72 | ALDH1A1 (0.34) | HPGDKDM4EALDH1A1NPC1RAB9A | |
| SCHEMBL20411177 | 0.72 | SMN1; SMN2 (0.39) | HPGDKDM4EALDH1A1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-9740097-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9740097-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291466-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291466-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291467-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291467-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |