SCHEMBL6757935

SCHEMBL6757935

C=Cc1ccc(OC(C)OC(C)OCCc2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ PPARG P37231 8/20 0.36
▸ PPARA Q07869 7/20 0.36
▸ CHRNB4 P30926 2/20 0.34
▸ CHRNA3 P32297 2/20 0.34
▸ CHRNA7 P36544 2/20 0.34
▸ NPC1 O15118 1/20 0.34
▸ RAB9A P51151 1/20 0.34
▸ CHRNB2 P17787 1/20 0.34
▸ CHRNA4 P43681 1/20 0.34
▸ FFAR1 O14842 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ GAA P10253 1/20 0.33
▸ RECQL P46063 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685739 0.93 PPARG (0.38) PPARGPPARACHRNB4CHRNA3CHRNA7
SCHEMBL6757938 0.86 PPARG (0.35) PPARGPPARACHRNB4CHRNA3CHRNA7
SCHEMBL3959570 0.80 CA1 (0.41) NPC1RAB9AALDH1A1TSHRHPGD
SCHEMBL2973189 0.79 LCK (0.39) PPARGPPARANPC1RAB9AALDH1A1
SCHEMBL28914735 0.79 CHRNB2 (0.40) CHRNB4CHRNA3CHRNA7CHRNB2CHRNA4
SCHEMBL14870412 0.79 PPARG (0.41) PPARGPPARAFFAR1
SCHEMBL2742278 0.78 NPC1 (0.41) PPARGPPARANPC1RAB9AFFAR1
SCHEMBL685647 0.77 CHRNA7 (0.46) CHRNB4CHRNA3CHRNA7NPC1CHRNB2
SCHEMBL3695401 0.76 ALDH1A1 (0.48) CHRNB4CHRNA3CHRNA7NPC1RAB9A
SCHEMBL10231956 0.75 RAB9A (0.42) PPARGPPARANPC1RAB9AFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6806023-B2 MIXTURE OF POLYMER, ACID GENERATING COMPOUND, SURFACTANT AND SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 2004-10-19 — — US disclosed
US-20010055726-A1 Positive radiation-sensitive composition FUJI PHOTO FILM CO., LTD. 2001-12-27 — — US disclosed
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