SCHEMBL2063751

SCHEMBL2063751

C=Cc1ccc(OC(C)OC(C)C2CCCCC2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 3/20 0.39
▸ NPC1 O15118 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ ALDH1A1 P00352 2/20 0.37
▸ KDM4E B2RXH2 1/20 0.37
▸ ALDH1A3 P47895 1/20 0.37
▸ GRM2 Q14416 4/20 0.35
▸ NPSR1 Q6W5P4 1/20 0.35
▸ MEN1 O00255 1/20 0.34
▸ MITF O75030 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ SLC6A2 P23975 2/20 0.32
▸ SLC6A4 P31645 2/20 0.32
▸ SLC6A3 Q01959 2/20 0.32
▸ POLB P06746 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ SIRT2 Q8IXJ6 1/20 0.31
▸ CHRNB4 P30926 2/20 0.31
▸ CHRNA3 P32297 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6755142 0.83 NPC1 (0.36) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL20411177 0.82 SMN1; SMN2 (0.39) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL5901245 0.81 ALDH1A3 (0.46) SMN1; SMN2NPC1RAB9AALDH1A1KDM4E
SCHEMBL685735 0.81 ALDH1A1 (0.35) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL5900974 0.79 ALDH1A1 (0.35) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL12159411 0.78 SMN1; SMN2 (0.37) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL5702518 0.77 HPGD (0.37) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL18120335 0.76 ALDH1A1 (0.35) SMN1; SMN2NPC1HPGDRAB9AALDH1A1
SCHEMBL18125567 0.75 HPGD (0.36) HPGDALDH1A1KDM4EALDH1A3CHRNB4
SCHEMBL24355012 0.75 HPGD (0.36) SMN1; SMN2NPC1HPGDRAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1158363-B1 Positive resist composition and onium salts of saccharin derivatives FUJIFILM CORP (JP) 2014-01-22 — — EP disclosed
US-8148044-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2012-04-03 — — US disclosed
US-7812194-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-10-12 — — US disclosed
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-10-07 — — US disclosed
US-7776512-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-08-17 — — US disclosed
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-06-03 — — US disclosed
US-20090148791-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2009-06-11 — — US disclosed
US-7435526-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2008-10-14 — — US disclosed
US-20070003871-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
EP-1656590-A2 NOVEL PHOTOSENSITIVE BILAYER COMPOSITION FujiFilm Electronic Materials USA, Inc. (US) 2006-05-17 — — EP disclosed
US-6727036-B2 COMPRISING A RESIN HAVING AN ACID-DECOMPOSING GROUP WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE ALKALI SOLUBILITY, COMPOUNDS GENERATE ACID BY IRRIADIATION OF ACTIVE LIGHT (ONE CONTRIBUTES DECOMPOSITION OTHER DOES NOT), SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 — — US disclosed
US-6605409-B2 Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power FUJI PHOTO FILM CO., LTD. (JP) 2003-08-12 — — US disclosed
US-20030075708-A1 Positive radiation-sensitive composition FUJI PHOTO FILM CO., LTD. 2003-04-24 — — US disclosed
US-20020102491-A1 Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) FUJI PHOTO FILM CO., LTD. 2002-08-01 — — US disclosed
EP-1199603-A9 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-31 — — EP disclosed
EP-1199603-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2002-04-24 — — EP disclosed
US-20020006578-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-01-17 — — US disclosed
US-20010055726-A1 Positive radiation-sensitive composition FUJI PHOTO FILM CO., LTD. 2001-12-27 — — US disclosed
EP-1158363-A1 Positive resist composition and onium salts of saccharin derivatives FUJI PHOTO FILM CO., LTD. (JP) 2001-11-28 — — EP disclosed
US-20010033993-A1 Positive-working radiation-sensitive composition FUJIFILM CORPORATION (JP) 2001-10-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION RARA, SUN2, RARG SMN1; SMN2 1350/4885NPC1 3151/4885HPGD 2839/4885
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AFF1, F12, AFF2 SMN1; SMN2 1888/4885NPC1 2607/4885HPGD 3396/4885
US-20020102491-A1 Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) RARA, ARSA, RARB SMN1; SMN2 494/4885NPC1 3444/4885HPGD 1619/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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