Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.47 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.47 |
| ▸ | AHR | P35869 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | HPGD | P15428 | 5/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | GUSB | P08236 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6560768 | 0.83 | CYP1A2 (0.52) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL27278262 | 0.81 | CYP1A2 (0.46) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL29438471 | 0.79 | ALDH1A1 (0.48) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL64873 | 0.79 | ALDH1A1 (0.48) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL5271517 | 0.79 | CYP1A2 (0.52) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL634142 | 0.78 | CYP1A2 (0.40) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL2350665 | 0.77 | CYP1A2 (0.46) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL7082199 | 0.76 | CYP1A2 (0.48) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL548370 | 0.75 | CYP1A2 (0.47) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL634103 | 0.74 | CYP1A2 (0.40) | CYP1A2ERBB2FYNMAOAACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260098188-A1 | RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-09 | — | — | US | disclosed |
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | JSR CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| EP-4692944-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4678709-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| EP-4678708-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20260011598-A1 | RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4653507-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2025-11-26 | — | — | EP | disclosed |
| EP-4653508-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2025-11-26 | — | — | EP | disclosed |
| EP-4636051-A1 | RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE | Nissan Chemical Corporation (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4583149-A1 | RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2025-07-09 | — | — | EP | disclosed |
| WO-2023008207-A1 | LAYERED BODY MANUFACTURING METHOD, AND KIT FOR ADHESIVE COMPOSITION | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-11320739-B2 | Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate | JSR CORPORATION (JP) | 2022-05-03 | — | — | US | disclosed |
| WO-2022075144-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR MANUFACTURING SUBSTRATE | JSR株式会社 | 2022-04-14 | — | — | WO | disclosed |
| US-20210286267-A1 | COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20180348633-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2018-12-06 | — | — | US | disclosed |
| US-9958781-B2 | Method for film formation, and pattern-forming method | JSR CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180046081-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING PROCESS, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2018-02-15 | — | — | US | disclosed |
| US-20160314984-A1 | METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| CN-105026389-A | Monomer, hardmask composition comprising the monomer, and method of forming pattern using the hardmask composition | CHEIL IND INC | 2015-11-04 | — | — | CN | disclosed |
| CN-104768912-A | Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition | CHEIL IND INC | 2015-07-08 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | TOP1, NAF1, ASH2L | CYP1A2 2762/4885ERBB2 1164/4885FYN 3407/4885 |
| US-20260098188-A1 | RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE | ERCC1, SMC2, SMC3 | CYP1A2 539/4885ERBB2 2936/4885FYN 3538/4885 |
| US-20260011598-A1 | RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | CBLC, PRRC2C, SMARCC2 | CYP1A2 2962/4885ERBB2 3041/4885FYN 708/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.