SCHEMBL18195977

SCHEMBL18195977

CC(C)CCC[C@@H](C)[C@H]1CC[C@H]2[C@@H]3CC[C@H]4C[C@@H](OS(=O)(=O)NS(C)(=O)=O)CC[C@]4(C)[C@H]3CC[C@]12C

nearest known ligand 0.65

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CDC25A P30304 4/20 0.65
POLA1 P09884 1/20 0.65
ST6GAL1 P15907 1/20 0.64
VDR P11473 2/20 0.62
CYP2D6 P10635 1/20 0.61
CYP2C19 P33261 1/20 0.61
ABCC4 O15439 2/20 0.60
INPP5D Q92835 1/20 0.60
FGF1 P05230 7/20 0.57
HPSE Q9Y251 7/20 0.57
GRIN1 Q05586 1/20 0.56
GRIN2B Q13224 1/20 0.56
ABCC1 P33527 1/20 0.56
FGF2 P09038 6/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13347854 0.90 VDR (0.76) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL13311422 0.90 VDR (0.76) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL17124639 0.90 VDR (0.76) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL18197739 0.90 CDC25A (0.61) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL18195963 0.90 CDC25A (0.61) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL25063600 0.87 ABCC4 (0.78) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL8902867 0.87 ABCC4 (0.78) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL8902302 0.87 ST6GAL1 (0.82) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL8902307 0.87 ST6GAL1 (0.82) CDC25APOLA1ST6GAL1VDRCYP2D6
SCHEMBL23594716 0.87 ABCC4 (0.78) CDC25APOLA1ST6GAL1VDRCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9703193-B2 Onium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-11 US disclosed
US-20160320698-A1 ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160320698-A1 ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SLC6A5, EIF2B5, EIF2B4 CDC25A 2127/4885POLA1 1334/4885ST6GAL1 4522/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.