SCHEMBL18212185

SCHEMBL18212185

CCCCS(=O)(=O)O/N=C(\C(=O)C(C)CC)c1nc2ccccc2o1

nearest known ligand 0.46

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ XDH P47989 4/20 0.44
▸ HSF1 Q00613 10/20 0.43
▸ FAAH O00519 2/20 0.42
▸ CES1 P23141 1/20 0.42
▸ ALDH1A1 P00352 1/20 0.39
▸ F2 P00734 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ MIF P14174 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16745519 0.80 ALOX15 (0.44) ALDH1A1LMNAMAPTHSD17B10
SCHEMBL6124067 0.70 NPC1 (0.45) XDHHSF1FAAHCES1ALDH1A1
SCHEMBL12629320 0.68 CES2 (0.39) CES1ALDH1A1LMNA
SCHEMBL6440944 0.68 CES2 (0.39) CES1ALDH1A1LMNA
SCHEMBL16745553 0.66 RAB9A (0.47) XDHFAAHCES1ALDH1A1F2
SCHEMBL17364359 0.65 XDH (0.55) XDHHSF1FAAHALDH1A1HSD17B10
SCHEMBL6124079 0.65 XDH (0.47) XDHHSF1FAAHCES1LMNA
SCHEMBL3962620 0.65 FAAH (0.85) FAAHCES1
SCHEMBL17364358 0.64 RAB9A (0.50) XDHFAAHCES1ALDH1A1F2
SCHEMBL14562869 0.64 FAAH (0.67) XDHFAAHCES1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9599901-B2 Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device FUJIFILM CORPORATION (JP) 2017-03-21 — — US disclosed
US-9599901-B2 Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device FUJIFILM CORPORATION (JP) 2017-03-21 — — US disclosed
US-20160327865-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2016-11-10 — — US disclosed
US-20160327865-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2016-11-10 — — US disclosed
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