SCHEMBL18218330

SCHEMBL18218330

O=Cc1cc(C(c2cc(C=O)c(O)c(CO)c2)c2cc(CO)c(O)c(CO)c2)cc(C=O)c1O

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 10/20 0.42
KDM4E B2RXH2 2/20 0.35
CASP6 P55212 1/20 0.35
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
AOX1 Q06278 1/20 0.33
TRIM24 O15164 1/20 0.33
TRIM33 Q9UPN9 1/20 0.33
PIM1 P11309 1/20 0.33
TYR P14679 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3081907 0.82 KDM4E (0.41) KDM4ECASP6ALDH1A1HPGD
SCHEMBL18218321 0.80 ERN1 (0.42) ERN1KDM4EMEN1ALDH1A1LMNA
SCHEMBL18218328 0.79 ERN1 (0.47) ERN1KDM4ECASP6
SCHEMBL14028988 0.77 ADRB2 (0.39) KDM4ECASP6
SCHEMBL18218325 0.76 SHBG (0.52) ERN1KDM4ECASP6MEN1ALDH1A1
SCHEMBL18218320 0.76 KDM4E (0.57) ERN1KDM4ECASP6MEN1ALDH1A1
SCHEMBL19411067 0.76 ERN1 (0.42) ERN1KDM4ECASP6MEN1ALDH1A1
SCHEMBL29942736 0.76 KDM4E (0.57) ERN1KDM4ECASP6MEN1ALDH1A1
SCHEMBL18218332 0.75 ERN1 (0.43) ERN1KDM4ECASP6MEN1ALDH1A1
SCHEMBL5021200 0.74 ERN1 (0.67) ERN1KDM4ECASP6ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 US disclosed