Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | CASP6 | P55212 | 1/20 | 0.41 |
| ▸ | SHBG | P04278 | 1/20 | 0.40 |
| ▸ | PDXK | O00764 | 1/20 | 0.34 |
| ▸ | ADRB2 | P07550 | 8/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.30 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.30 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14028988 | 0.93 | ADRB2 (0.39) | KDM4ECASP6SHBGADRB2CYP1A2 | |
| SCHEMBL18218330 | 0.82 | ERN1 (0.42) | KDM4ECASP6ALDH1A1HPGD | |
| SCHEMBL10130846 | 0.81 | PDE4A (0.43) | KDM4ETSHRALDH1A1 | |
| SCHEMBL4455166 | 0.80 | GABRA1 (0.45) | KDM4ECASP6SHBGADRB2CYP1A2 | |
| SCHEMBL12134634 | 0.78 | TSHR (0.44) | KDM4ETSHRNFKB1ACHE | |
| SCHEMBL12418948 | 0.78 | SHBG (0.37) | KDM4ECASP6SHBGADRB2CYP1A2 | |
| SCHEMBL14461952 | 0.77 | GABRA1 (0.48) | CYP1A2ALDH1A1GABRA1GABRB2 | |
| SCHEMBL16865574 | 0.77 | SHBG (0.39) | KDM4ECASP6SHBGADRB2CYP1A2 | |
| SCHEMBL10051851 | 0.77 | HKDC1 (0.48) | KDM4ECASP6SHBGADRB2CYP1A2 | |
| SCHEMBL4459305 | 0.75 | ALDH1A1 (0.43) | KDM4ECASP6SHBGADRB2CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| WO-2024018957-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230350299-A1 | STEP SUBSTRATE COATING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-11798810-B2 | Resist underlayer film-forming composition containing amide solvent | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230333474-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230335697-A1 | DISPLAY DEVICE AND PRODUCTION METHOD FOR DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230324801-A1 | UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-12 | — | — | US | disclosed |
| US-20230324802-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-10-12 | — | — | US | disclosed |
| US-7977400-B2 | polyimide, unsaturated polymerizable compound, photoinitiator; crosslinkable to form addition-condensation copolymer or polyetherimide copolymer; no imidation of polymer through high-temperature heat treatment; alkaline development; polyimide film having excellent heat resistance, strength, elongation | TORAY INDUSTRIES, INC. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100233619-A1 | NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE NOVEL POLYIMIDE SILICONE, AND METHOD FOR PATTERN FORMATION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| EP-2228400-A1 | Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-09-15 | — | — | EP | disclosed |
| US-7476476-B2 | Photosensitive resin composition, electronic component using the same, and display unit using the same | TORAY INDUSTRIES, INC. (JP) | 2009-01-13 | — | — | US | disclosed |
| US-7381517-B2 | Curable composition and image forming material containing the same | FUJIFILM CORPORATION (JP) | 2008-06-03 | — | — | US | disclosed |
| US-7381517-B2 | Curable composition and image forming material containing the same | FUJIFILM CORPORATION (JP) | 2008-06-03 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080075999-A1 | Polyelectrolyte Material, Polyelectrolyte Component, Membrane Electrode Composite Body, and Polyelectrolyte Type Fuel Cell | TORAY INDUSTRIES, INC. (JP) | 2008-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | KDM4E 117/4885CASP6 3132/4885SHBG 3852/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.