SCHEMBL18218328

SCHEMBL18218328

O=Cc1cc(-c2cc(CO)c(O)c(CO)c2)cc(C=O)c1O

nearest known ligand 0.47

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ ERN1 O75460 18/20 0.47
▸ KDM4E B2RXH2 1/20 0.38
▸ CASP6 P55212 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11648853 0.84 ERN1 (0.48) ERN1
SCHEMBL20806244 0.82 ERN1 (0.64) ERN1
SCHEMBL18218325 0.81 SHBG (0.52) ERN1KDM4ECASP6
SCHEMBL26132747 0.80 KDM4E (0.46) KDM4ECASP6
SCHEMBL835866 0.80 KDM4E (0.46) KDM4ECASP6
SCHEMBL18218330 0.79 ERN1 (0.42) ERN1KDM4ECASP6
SCHEMBL20465839 0.77 ERN1 (0.40) ERN1KDM4ECASP6
SCHEMBL18218335 0.77 ALOX15 (0.46) ERN1KDM4ECASP6
SCHEMBL18218320 0.76 KDM4E (0.57) ERN1KDM4ECASP6
SCHEMBL19411067 0.76 ERN1 (0.42) ERN1KDM4ECASP6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 — — US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 — — US disclosed
Send feedback