Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 3/20 | 0.61 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.61 |
| ▸ | HTT | P42858 | 1/20 | 0.61 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | CASP1 | P29466 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.45 |
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.41 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.41 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.41 |
| ▸ | RET | P07949 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26134510 | 1.00 | ALOX15 (0.61) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL14028985 | 0.98 | ALOX15 (0.59) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL12285444 | 0.92 | ALOX15 (0.53) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL25446794 | 0.90 | ALOX15 (0.52) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL21096823 | 0.90 | ALOX15 (0.52) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL836696 | 0.89 | SHBG (0.57) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL10051856 | 0.88 | KLF10 (0.59) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL4852210 | 0.88 | KLF10 (0.55) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL8733565 | 0.88 | KLF10 (0.59) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL29310140 | 0.87 | ALOX15 (0.49) | ALOX15KLF10MAPK1HTTHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 764 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118092074-B | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-08-20 | — | — | CN | claimed |
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| CN-112010737-B | Synthetic method of 2, 2-bis (4-hydroxy-3, 5-dimethylphenyl) propane | 南京法恩化学有限公司 | 2022-03-29 | — | — | CN | claimed |
| US-4438189-A | POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-20 | — | — | US | claimed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | claimed |
| US-12638772-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | THE PILOT INK CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-0059250-B1 | LIGHT-SENSITIVE COMPOSITION AND COPYING MATERIAL PREPARED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-09-04 | — | — | EP | disclosed |
| EP-0050802-B1 | LIGHT-SENSITIVE COMPOSITION, LIGHT-SENSITIVE COPYING MATERIAL MADE THEREFROM, AND PROCESS FOR PRODUCING A PRINTING FORME FROM THIS MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-04-10 | — | — | EP | disclosed |
| EP-0111273-A2 | Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-06-20 | — | — | EP | disclosed |
| US-4438189-A | POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-20 | — | — | US | disclosed |
| US-4404272-A | Light-sensitive mixture and copying material prepared therefrom with novolak having brominated phenol units | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-09-13 | — | — | US | disclosed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | disclosed |
| EP-0059250-A1 | Light-sensitive composition and copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-09-08 | — | — | EP | disclosed |
| EP-0050802-A2 | Light-sensitive composition, light-sensitive copying material made therefrom, and process for producing a printing forme from this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-05-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | ALOX15 1956/4885KLF10 1589/4885MAPK1 622/4885 |
| US-12638772-B2 | Resist underlayer film-forming composition | RFC2, RFC1, RFC4 | ALOX15 1164/4885KLF10 114/4885MAPK1 3955/4885 |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | TYR, SCO2, HBB | ALOX15 521/4885KLF10 1922/4885MAPK1 235/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | ALOX15 1285/4885KLF10 1387/4885MAPK1 2523/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.