Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18791205 | 0.93 | TSHR (0.38) | THRBTSHRALDH1A1 | |
| SCHEMBL14533207 | 0.87 | ALDH1A1 (0.41) | THRBTSHRALDH1A1 | |
| SCHEMBL22317681 | 0.87 | ALDH1A1 (0.41) | THRBTSHRALDH1A1 | |
| SCHEMBL18785989 | 0.85 | THRB (0.37) | THRBTSHRALDH1A1 | |
| SCHEMBL19558274 | 0.83 | THRB (0.32) | THRBTSHRALDH1A1 | |
| SCHEMBL18455465 | 0.82 | THRB (0.33) | THRBTSHRALDH1A1 | |
| SCHEMBL19335327 | 0.82 | — | — | |
| SCHEMBL22336257 | 0.81 | ALDH1A1 (0.40) | TSHRALDH1A1 | |
| SCHEMBL23963451 | 0.81 | TSHR (0.36) | THRBTSHRALDH1A1 | |
| SCHEMBL524812 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11656548-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-23 | — | — | US | disclosed |
| US-20200319551-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MASK BLANK WITH RESIST FILM, METHOD FOR PRODUCING PHOTOMASK, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| US-20200259094-A1 | CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-10559397-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-11 | — | — | US | disclosed |
| US-10515735-B2 | — | — | 2019-12-24 | — | — | US | disclosed |
| US-10240061-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| US-10023752-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9958777-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9829792-B2 | Monomer, polymer, positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-28 | — | — | US | disclosed |
| US-20170233596-A1 | CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-17 | — | — | US | disclosed |
| US-20170205709-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-20170130070-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170108775-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | CASR, LIFR, LBR | THRB 2365/4885TSHR 508/4885ALDH1A1 4520/4885 |
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | HCN4, HCN2, HCN3 | THRB 3013/4885TSHR 3253/4885ALDH1A1 2526/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.