SCHEMBL184649

SCHEMBL184649

CC(C)(N)C(C)(C)CCCCCCN

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 9/20 0.42
CA12 O43570 2/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA3 P07451 2/20 0.42
CA4 P22748 2/20 0.42
CA6 P23280 2/20 0.42
CA5A P35218 2/20 0.42
CA7 P43166 2/20 0.42
CA9 Q16790 2/20 0.42
CA14 Q9ULX7 2/20 0.42
CA5B Q9Y2D0 2/20 0.42
TSHR P16473 2/20 0.42
LMNA P02545 1/20 0.42
BLM P54132 1/20 0.42
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
ALDH1A1 P00352 1/20 0.39
EPHX1 P07099 1/20 0.39
NFKB1 P19838 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2879557 1.00 DNM1 (0.42) DNM1CA12CA1CA2CA3
SCHEMBL1978386 1.00 DNM1 (0.42) DNM1CA12CA1CA2CA3
SCHEMBL184660 1.00 DNM1 (0.42) DNM1CA12CA1CA2CA3
SCHEMBL6293903 1.00 DNM1 (0.42) DNM1CA12CA1CA2CA3
SCHEMBL2865068 1.00 DNM1 (0.42) DNM1CA12CA1CA2CA3
Hydrochloric Acid SCHEMBL29265101 0.97 DNM1 (0.42) DNM1CA12CA1CA2CA3
SCHEMBL185535 0.97 NFKB1 (0.39) DNM1CA12CA1CA2CA3
Bromide SCHEMBL22397854 0.95 DNM1 (0.38) DNM1CA12CA1CA2CA3
Hydrochloric Acid SCHEMBL29265105 0.95 DNM1 (0.38) DNM1CA12CA1CA2CA3
Bromide SCHEMBL29265121 0.92 DNM1 (0.36) DNM1CA12CA1CA2CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2005016520-A2 SYNTHESIS OF MOLECULAR SIEVES OF CHA FRAMEWORK TYPE EXXONMOBIL CHEMICAL PATENTS INC. (US) 2005-02-24 WO claimed
US-20030199704-A1 Alkyl group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-10-23 US claimed
US-20250388725-A1 USE OF A COMPOSITION COMPRISING A POLYAMINOAMIDE TYPE COMPOUND FOR COPPER NANOTWIN ELECTRODEPOSITION BASF SE (DE) 2025-12-25 US disclosed
EP-4409058-B1 COMPOSITION FOR COPPER ELECTRODEPOSITION COMPRISING A POLYAMINOAMIDE TYPE LEVELING AGENT BASF SE (DE) 2025-11-05 EP disclosed
EP-4127025-B1 COMPOSITION FOR COPPER BUMP ELECTRODEPOSITION COMPRISING A POLYAMINOAMIDE TYPE LEVELING AGENT BASF SE (DE) 2025-10-01 EP disclosed
EP-4551742-A1 USE OF A COMPOSITION COMPRISING A POLYAMINOAMIDE TYPE COMPOUND FOR COPPER NANOTWIN ELECTRODEPOSITION BASF SE (DE) 2025-05-14 EP disclosed
US-20250129503-A1 COMPOSITION FOR COPPER ELECTRODEPOSITION COMPRISING A POLYAMINOAMIDE TYPE LEVELING AGENT BASF SE (DE) 2025-04-24 US disclosed
US-12134834-B2 Composition for copper bump electrodeposition comprising a polyaminoamide type leveling agent BASF SE (DE) 2024-11-05 US disclosed
EP-4409058-A1 COMPOSITION FOR COPPER ELECTRODEPOSITION COMPRISING A POLYAMINOAMIDE TYPE LEVELING AGENT BASF SE (DE) 2024-08-07 EP disclosed
US-20240043638-A1 THERMOPLASTIC COMPOSITES MATERIALS SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2024-02-08 US disclosed
WO-2024008562-A1 USE OF A COMPOSITION COMPRISING A POLYAMINOAMIDE TYPE COMPOUND FOR COPPER NANOTWIN ELECTRODEPOSITION BASF SE (DE) 2024-01-11 WO disclosed
CN-100486680-C Method for manufacturing polyamide reverse osmosis composite membrane and polyamide reverse osmosis composite membrane manufactured by same WOONGJINCOWAY CO LTD (KR) 2009-05-13 CN disclosed
CN-101027113-A Method for manufacturing polyamide reverse osmosis composite membrane and polyamide reverse osmosis composite membrane manufactured by same WOONGJINCOWAY CO LTD (KR) 2007-08-29 CN disclosed
US-6956127-B2 Alkyl group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2005-10-18 US disclosed
US-6939983-B2 Alkyl group VA metal compounds ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2005-09-06 US disclosed
US-20050033073-A1 Alkyl group VA metal compounds ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-02-10 US disclosed
US-20030199704-A1 Alkyl group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-10-23 US disclosed
CN-1445233-A ALkyl VA group metal compound HIPREY CORP (US) 2003-10-01 CN disclosed
US-20030181746-A1 Alkyl Group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-09-25 US disclosed
EP-1335416-A1 Preparation of monoalkyl group 15 metal dihalides and dihydrides Shipley Co. L.L.C. (US) 2003-08-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250388725-A1 USE OF A COMPOSITION COMPRISING A POLYAMINOAMIDE TYPE COMPOUND FOR COPPER NANOTWIN ELECTRODEPOSITION AOC1, NPR1, BCAT1 DNM1 1934/4885CA12 107/4885CA1 146/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.