SCHEMBL18479637

SCHEMBL18479637

CC(C)(C)C(=O)Oc1ccc(C(O)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.59

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 12/20 0.59
▸ SMN1; SMN2 Q16637 2/20 0.47
▸ MLYCD O95822 1/20 0.46
▸ NR1H2 P55055 4/20 0.46
▸ NR1H3 Q13133 4/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13059563 0.84 ELANE (0.47) ELANESMN1; SMN2MLYCDNR1H2NR1H3
SCHEMBL18994832 0.84 ELANE (0.66) ELANE
SCHEMBL22369614 0.81 ELANE (0.86) ELANE
SCHEMBL21776385 0.81 LMNA (0.43) ELANESMN1; SMN2MLYCDNR1H2NR1H3
SCHEMBL17678829 0.80 ELANE (0.70) ELANE
SCHEMBL16904842 0.80 ELANE (0.70) ELANESMN1; SMN2
SCHEMBL28365026 0.79 KIF11 (0.64) SMN1; SMN2MLYCDNR1H2NR1H3
SCHEMBL24218974 0.78 SMN1; SMN2 (0.46) SMN1; SMN2MLYCDNR1H2NR1H3
SCHEMBL15840341 0.77 ELANE (0.50) ELANESMN1; SMN2MLYCDNR1H2NR1H3
SCHEMBL22336441 0.76 NR1H2 (0.47) SMN1; SMN2MLYCDNR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10948822-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-16 — — US disclosed
US-20200259094-A1 CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-13 — — US disclosed
US-9815930-B2 Block copolymer and associated photoresist composition and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-11-14 — — US disclosed
US-20170037178-A1 BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 — — US disclosed
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