Ethylene Glycol

Ethylene Glycol

SCHEMBL18525379

COc1ccc2oc3ccccc3c(=O)c2c1.OCCO

nearest known ligand 0.86

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 6/20 0.86
▸ KDM4E B2RXH2 6/20 0.71
▸ NPC1 O15118 5/20 0.71
▸ RAB9A P51151 4/20 0.71
▸ ALDH1A1 P00352 4/20 0.71
▸ MAPT P10636 4/20 0.71
▸ HPGD P15428 4/20 0.71
▸ SMN1; SMN2 Q16637 3/20 0.71
▸ CASP3 P42574 1/20 0.71
▸ SENP8 Q96LD8 1/20 0.71
▸ SENP7 Q9BQF6 1/20 0.71
▸ SENP6 Q9GZR1 1/20 0.71
▸ POLB P06746 1/20 0.61
▸ L3MBTL1 Q9Y468 1/20 0.61
▸ MEN1 O00255 2/20 0.60
▸ KMT2A Q03164 2/20 0.60
▸ CYP3A4 P08684 4/20 0.58
▸ TSHR P16473 3/20 0.58
▸ HSD17B10 Q99714 3/20 0.58
▸ CYP2D6 P10635 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL394209 0.93 MAOA (1.00) MAOAKDM4ENPC1RAB9AALDH1A1
Ethylene SCHEMBL18528476 0.90 MAOA (0.94) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL1567209 0.86 MAOA (0.86) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL29619913 0.84 ALDH1A1 (1.00) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL2161251 0.84 ALDH1A1 (1.00) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL29958722 0.83 MAOA (1.00) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL789950 0.83 MAOA (1.00) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL27895770 0.82 ACSL1 (0.66) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL7331388 0.82 KDM4E (0.86) MAOAKDM4ENPC1RAB9AALDH1A1
SCHEMBL20317207 0.81 NPC1 (0.78) MAOAKDM4ENPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3133444-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND OSAKA UNIVERSITY (JP) 2017-02-22 — — EP disclosed
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