Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.52 |
| ▸ | TSHR | P16473 | 5/20 | 0.52 |
| ▸ | HPGD | P15428 | 4/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | CASP1 | P29466 | 1/20 | 0.45 |
| ▸ | CASP7 | P55210 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | CRHBP | P24387 | 1/20 | 0.43 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.43 |
| ▸ | PARP1 | P09874 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17781311 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL18600594 | 0.90 | ALDH1A1 (0.52) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL1351306 | 0.89 | ALDH1A1 (0.58) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL22990637 | 0.86 | ALDH1A1 (0.61) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL29596758 | 0.85 | KEAP1 (0.45) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL28534201 | 0.84 | HSD17B10 (0.58) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| Biphenyl SCHEMBL26686863 | 0.80 | ALDH1A1 (0.48) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL4845687 | 0.80 | CYP1A2 (0.58) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL1978995 | 0.80 | CYP1A2 (0.58) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 | |
| SCHEMBL11302617 | 0.80 | CYP1A2 (0.58) | ALDH1A1TSHRHPGDCYP3A4HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-10437148-B2 | Resist material, resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-10-08 | — | — | US | disclosed |
| US-10310377-B2 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-06-04 | — | — | US | disclosed |
| EP-3141959-B1 | LITHOGRAPHIC FILM FORMATION MATERIAL, COMPOSITION FOR LITHOGRAPHIC FILM FORMATION, LITHOGRAPHIC FILM, PATTERN FORMATION METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-01-30 | — | — | EP | disclosed |
| US-20170145142-A1 | RESIST MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170144954-A1 | MATERIAL FOR FORMING FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-05-25 | — | — | US | disclosed |
| EP-3141957-A1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-03-15 | — | — | EP | disclosed |
| EP-3141959-A1 | LITHOGRAPHIC FILM FORMATION MATERIAL, COMPOSITION FOR LITHOGRAPHIC FILM FORMATION, LITHOGRAPHIC FILM, PATTERN FORMATION METHOD, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-03-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170144954-A1 | MATERIAL FOR FORMING FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | FRG1, MLLT3, FEM1B | ALDH1A1 3533/4885TSHR 3481/4885HPGD 3807/4885 |
| US-10310377-B2 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | FRG1, MLLT3, FEM1B | ALDH1A1 3533/4885TSHR 3481/4885HPGD 3807/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.