SCHEMBL18648019

SCHEMBL18648019

Cc1ccc(S(=O)(=O)O/N=C(\c2nc3ccccc3s2)c2cccc3ccccc23)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CNR1 P21554 1/20 0.42
▸ TDP1 Q9NUW8 3/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ MAPT P10636 4/20 0.40
▸ CYP3A4 P08684 3/20 0.40
▸ CYP2C9 P11712 2/20 0.40
▸ GAA P10253 2/20 0.40
▸ KMT2A Q03164 5/20 0.40
▸ MEN1 O00255 4/20 0.40
▸ NPC1 O15118 3/20 0.40
▸ RAB9A P51151 3/20 0.40
▸ CYP1A2 P05177 2/20 0.40
▸ CYP2C19 P33261 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ KCNH2 Q12809 1/20 0.40
▸ ALDH1A1 P00352 3/20 0.39
▸ GLO1 Q04760 1/20 0.39
▸ MAPK1 P28482 2/20 0.38
▸ HTT P42858 2/20 0.38
▸ LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6127765 1.00 CNR1 (0.42) CNR1TDP1KDM4EMAPTCYP3A4
SCHEMBL18648020 0.84 KDM4E (0.45) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL6127764 0.84 KDM4E (0.45) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL6124089 0.82 GLO1 (0.44) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL17364364 0.78 ALDH1A1 (0.47) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL6127763 0.77 SMN1; SMN2 (0.49) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL19285999 0.77 SMN1; SMN2 (0.49) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL16381782 0.75 ALOX15 (0.46) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL16381778 0.75 MAPT (0.44) TDP1KDM4EMAPTCYP3A4CYP2C9
SCHEMBL16381787 0.75 GLO1 (0.44) TDP1KDM4EMAPTCYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9929376-B2 Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor FUJIFILM CORPORATION (JP) 2018-03-27 — — US disclosed
US-9601706-B2 Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-03-21 — — US disclosed
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