SCHEMBL18697238

SCHEMBL18697238

CC(C)(C)Oc1ccc(Sc2ccc(OC(C)(C)C)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 1/20 0.40
PTGIR P43119 3/20 0.38
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
SLC6A3 Q01959 1/20 0.37
KIF11 P52732 1/20 0.36
MAPK1 P28482 2/20 0.36
CYP3A4 P08684 2/20 0.36
NR1H2 P55055 1/20 0.36
TSHR P16473 1/20 0.36
HPGD P15428 3/20 0.34
LMNA P02545 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
SMN1; SMN2 Q16637 4/20 0.33
ACACB O00763 1/20 0.33
RIPK1 Q13546 1/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
MAPT P10636 2/20 0.33
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22653104 0.93 KIF11 (0.37) STSPTGIRSLC6A2SLC6A4SLC6A3
SCHEMBL22688263 0.91 MLYCD (0.43) STSPTGIRMAPK1CYP3A4TSHR
SCHEMBL15299026 0.91 SMN1; SMN2 (0.42) STSPTGIRSLC6A2SLC6A4SLC6A3
SCHEMBL16281931 0.89 ALDH1A1 (0.42) PTGIRKIF11MAPK1TSHRHPGD
SCHEMBL3421211 0.89 NR1H2 (0.56) STSPTGIRSLC6A2SLC6A4SLC6A3
SCHEMBL23506920 0.86 LTA4H (0.41) SLC6A4KIF11NR1H2TSHRHPGD
SCHEMBL18807766 0.84 RAB9A (0.52) PTGIRKIF11MAPK1TSHRHPGD
SCHEMBL18807772 0.84 RAB9A (0.52) PTGIRKIF11MAPK1TSHRHPGD
SCHEMBL18807837 0.84 RAB9A (0.52) PTGIRKIF11MAPK1TSHRHPGD
SCHEMBL18807773 0.84 RAB9A (0.52) PTGIRKIF11MAPK1TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3032333-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-05-24 EP disclosed
EP-3032332-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-04-05 EP disclosed